Where does Rohm and Haas Electronic Materials LLC rank among US patent assignees?

According to USPTO PatentsView (2015–2025 granted utility patents), Rohm and Haas Electronic Materials LLC ranks #953 of 49,997 assignees by granted-patent volume, the same sort as the companies listing and top-holders ranking. See /methodology/#corpus-placement.

How many patents does Rohm and Haas Electronic Materials LLC hold?

Rohm and Haas Electronic Materials LLC holds 464 US utility patents granted between 2015 and 2025, spanning 75 technology areas.

What is Rohm and Haas Electronic Materials LLC's Innovation Score?

Rohm and Haas Electronic Materials LLC has an Innovation Score of 56.2 out of 100 (top 6% of the corpus). This composite metric weighs portfolio volume (40%), grant velocity (20%), technology breadth (25%), and claim depth (15%).

Is Rohm and Haas Electronic Materials LLC's patent grant rate increasing or decreasing?

Rohm and Haas Electronic Materials LLC's recent grant velocity is -66% compared to the prior five-year period (grant years, not application filing dates). Grant activity has slowed relative to earlier years.

What does claim depth mean for Rohm and Haas Electronic Materials LLC's patents?

Rohm and Haas Electronic Materials LLC's patents average 10.9 claims each. This is an aggregate descriptive count from the grant record; it does not establish claim scope, legal strength, enforceability, or design-around risk.

How is the Rohm and Haas Electronic Materials LLC patent data sourced?

All patent data comes from USPTO PatentsView, a public research dataset maintained by the United States Patent and Trademark Office covering US granted utility patents from 2015 to 2025.

USPTO 2015–2025 USPTO PatentsView US Corporation

Rohm and Haas Electronic Materials LLC

Q: What technology areas does Rohm and Haas Electronic Materials LLC focus on?

Rohm and Haas Electronic Materials LLC's top technology area is G03F (Photomechanical Production OF Textured OR Patterned Surfaces, e.g. FOR Printing, FOR Processing OF Semiconductor DEVICES; Materials THEREFOR; Originals THEREFOR; Apparatus Specially Adapted THEREFOR;) with 225 patents. Grants appear in 75 CPC subclasses total.

USPTO PatentsView assignee record - 464 granted patents across 75 technology areas, recorded in grant years 2015–2025. Grant-trend analysis is cross-referenced to USPTO Patent Public Search; it does not measure application filings, current R&D, or legal strength. Primary class: G03F (Photomechanical Production OF Textured OR Patterned Surfaces, e.g. FOR Printing, FOR Processing OF Semiconductor DEVICES; Materials THEREFOR; Originals THEREFOR; Apparatus Specially Adapted THEREFOR;).

Compiled by PlainPatent · May 15, 2026

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Explore the portfolio See the ranking

The verdict

According to USPTO PatentsView, Rohm ranks #953 of 49,997 tracked US assignees by granted-patent volume, with 464 patents across 75 technology areas.

#953
of 49,997 US assignees by volume: Top 6%
by Innovation Score (56.2/100): 10.9
avg claims per patent: -66%
grant velocity, last 5 yrs

USPTO PatentsView assignee plate

Corpus R953 · US Corporation #953 · 464 grants

GRANTS-MID · TOP-DECILE · PHOTO-FINISH · CPC-WIDE · INNOV-PAR · CLAIMS-PAR · TYPE-USCORP · VEL-DROP · BOOK-FULL

GRANTS-MID 464 grants
TOP-DECILE #953/49,997
PHOTO-FINISH National University…
CPC-WIDE G03F · 75 areas
INNOV-PAR 56.2/100
CLAIMS-PAR 10.9 claims/avg
TYPE-USCORP US Corporation
VEL-DROP -66% vel
BOOK-FULL 10/10 fields

Nearest grant-volume peer: National University OF Singapore (±0 grants)

Instrument codes from this assignee’s USPTO PatentsView grant sheet: volume band, corpus rank, photo-finish peer, lead CPC, Innovation Score, claim depth, assignee type, velocity, and book completeness. Not a USPTO rating of patent strength.

Qualcomm Incorporated · highest

85
Beijing Jingdong… · near

56
Hitachi Kokusai… · near

56
Rohm and Haas… · this assignee

56
The Alfred E Mann… · near

56
The Hong Kong… · near

56
3D Lighting… · lowest

7

What this shows Rohm's Innovation Score is 56.2/100 (top 6% of the PatentsView-derived corpus). The chart places that score against the nearest Innovation Score peers plus corpus poles, not a reprint of the volume ranking.

How Rohm's grant cadence moved

Between 2020–2024, Rohm and Haas Electronic Materials LLC received 116 grants versus 344 in 2015–2019 (-66% equal-window velocity, below median growth). Across complete PatentsView years, output peaked in 2016 at 91 grants and bottomed in 2022 at 14. Lead class G03F accounts for 48.5% of the portfolio across 75 subclasses. Volume neighbours: Siemens Healthineers AG (#949) and Himax Technologies Limited (#957).

Rohm's three-year grant acceleration

From 2019–2021 to 2022–2024, Rohm and Haas Electronic Materials LLC moved from 110 to 56 grants (0.51x the prior three-year total, a multiple, not a CAGR). Among 3,296 tracked assignees with ≥100 grants and ≥20 prior-period grants, that multiple ranks #2,674. See the growth leaderboard.

Siemens Healthine…

466
Snap-on Incorpora…

465
Syngenta Crop Pro…

465
National Universi…

464
Rohm and Haas Mat… ◀

464
Netflix

463
THE Trustees OF P…

463
CNH Industrial Ca…

462
Himax

462

What this shows Rohm holds 464 patents at rank #953, shown against the 8 assignees closest to it in grant volume rather than the industry's largest filers.

Companies ranked near Rohm

By rank, the assignees closest to #953 in granted patent volume.

Leaders in G03F (Photomechanical Production OF Textured OR Patterned Surfaces)

Other assignees with the most granted patents in Rohm's primary technology class.

Assignees with similar portfolio profiles

Two PlainPatent-derived peer sets for Rohm, neither rank-band nor same-CPC leaders (those blocks stay above).

Similar innovation score

Nearest assignees by Innovation Score (56 here).

Hitachi Kokusai Electric Inc. 56 Beijing Jingdong Shangke Information Technology Co., Ltd. 56 The Hong Kong Polytechnic University 56 The Alfred E. Mann Foundation for Scientific Research 56

Similar claim depth

Nearest assignees by average claims per patent (10.9 here).

King Abdulaziz University 10.9 avg Abus August Bremicker Söhne KG 10.9 avg Hitachi-lg Data Storage, Inc. 10.9 avg Xidian University 10.9 avg

Rohm's Innovation Score vs. every tracked assignee

Composite of portfolio volume, grant velocity, technology breadth, and claim depth (0–100)

56 Top 6% higher than 94% of 49,997 US assignees

Each bar is a band; taller bars hold more US assignees. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.

Source USPTO PatentsView, PlainPatent Innovation Score · 2015–2025

USPTO utility patent grants by year · 2015–2025

Grants by year

Teal-shaded recent years (2020–present) versus the 2015–2019 baseline. Full figures in the table below.

View data table

Rohm and Haas Electronic Materials LLC patent grants by year, 2015–2025
Year	Patents Granted	Share of Period
2015	78	16.8%
2016	91	19.6%
2017	73	15.7%
2018	52	11.2%
2019	50	10.8%
2020	38	8.2%
2021	22	4.7%
2022	14	3.0%
2023	25	5.4%
2024	17	3.7%
2025partial year	4	0.9%

Which technologies does Rohm and Haas Electronic Materials LLC patent most?

G03F - Photomechanical Production OF Textured OR Patterned Surfaces, e.g. FOR Printing, FOR Processing OF Semiconductor DEVICES; Materials THEREFOR; Originals THEREFOR; Apparatus Specially Adapted THEREFOR; 225

H01L - Semiconductor Devices NOT Covered BY Class H10 133

C09D - Coating Compositions, e.g. Paints, Varnishes OR LACQUERS; Filling PASTES; Chemical Paint OR INK REMOVERS; INKS; Correcting FLUIDS; WOODSTAINS; Pastes OR Solids FOR Colouring OR PRINTING; USE OF Materials Therefor 130

C08F - Macromolecular Compounds Obtained BY Reactions Only Involving Carbon-to-carbon Unsaturated Bonds 91

C08G - Macromolecular Compounds Obtained Otherwise Than BY Reactions Only Involving Unsaturated Carbon-to-carbon Bonds 89

C25D - Processes FOR THE Electrolytic OR Electrophoretic Production OF COATINGS; ELECTROFORMING; Apparatus Therefor 86

C23C - Coating Metallic MATERIAL; Coating Material With Metallic MATERIAL; Surface Treatment OF Metallic Material BY Diffusion Into THE Surface, BY Chemical Conversion OR SUBSTITUTION; Coating BY Vacuum Evaporation, BY Sputtering, BY ION Implantation OR BY Chemical Vapour Deposition, IN General 68

C07C - Acyclic OR Carbocyclic Compounds 66

H05K - Printed CIRCUITS; Casings OR Constructional Details OF Electric APPARATUS; Manufacture OF Assemblages OF Electrical Components 64

C08L - Compositions OF Macromolecular Compounds 52

C07D - Heterocyclic Compounds 44

C08K - Use of inorganic or non-macromolecular organic substances as compounding ingredients 38

H10K - Organic Electric Solid-state Devices 25

Y10T - Technical Subjects Covered BY Former US Classification 21

B01J - Chemical OR Physical Processes, e.g. Catalysis OR Colloid CHEMISTRY; Their Relevant Apparatus 18

Top 15 of 75 technology areas

Where it ranks

Overall rank by patents

#953

of 49,997 tracked assignees

Innovation Score

56.2 out of 100

View all rankings →

Data Source

USPTO PatentsView, US granted patents 2015–2025

How is Innovation Score calculated?

What to do with this data

Rohm and Haas Electronic Materials LLC's patent record in context - here's where to go next.

Rohm and Haas Electronic Materials LLC's lead technology class is G03F (Photomechanical Production OF Textured OR Patterned Surfaces, e.g. FOR Printing, FOR Processing OF Semiconductor DEVICES; Materials THEREFOR; Originals THEREFOR; Apparatus Specially Adapted THEREFOR;), 48.5% of its portfolio - see every assignee active in that class. Explore G03F
Ranked #953 of 49,997 tracked assignees by patent volume - see the full leaderboard. See the ranking
Compare Rohm and Haas Electronic Materials LLC against Siemens Healthineers AG, an assignee filing at a similar volume. Compare portfolios
Innovation Score of 56.2/100 blends volume, velocity, technology breadth, and claim depth. How it's calculated

Figures reflect USPTO PatentsView grant data through May 2026; pending applications not yet granted are not counted.

Data sourced from USPTO PatentsView - official U.S. government patent data. See our methodology for computation details. Retrieved and formatted by PlainPatent

Disclaimer: This information is provided for informational purposes only and does not constitute professional advice. Data is sourced from the USPTO PatentsView database. Consult a qualified professional before making decisions based on this data.

Read our methodology - how this data is sourced, computed, and verified.

Data sources used on this page

USPTO PatentsView - the disambiguated bulk patent-grant, assignee, and CPC data this page's figures are derived from. patentsview.org
Cooperative Patent Classification (CPC) - the joint USPTO/EPO classification scheme used to group patents by technology area. cooperativepatentclassification.org
USPTO Patent Public Search - the official interface to verify the status of any individual patent. ppubs.uspto.gov

Compiled by PlainPatent, US Patent Intelligence Editorial Process · May 15, 2026

Every figure on PlainPatent is rendered directly from USPTO source data, no number is typed in by an editor. This page draws directly on USPTO source data, no figure is typed in by an editor. See our editorial standards & corrections policy, the methodology behind these numbers, or report a data error. Data current as of May 2026.