CPC technology class · G03
G03F - Photomechanical Production Of Textured Or Patterned Surfaces
Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor;. 21,670 US utility patents granted 2015–2025, with the leading assignees and year-by-year grant trajectory.
- 21,670
- US patents granted
- #3/6
- in G03
- 29.6%
- G03 class share
- -18%
- 5-yr velocity
The verdict
According to USPTO PatentsView, Photomechanical Production Of Textured Or Patterned Surfaces ranks #94 of 670 CPC technology areas - 21,670 US patents granted since 2015, with recorded grant volume down 18% over five years.
- #94
- of 670 CPC technology areas
- 21,670
- US patents granted, 2015–2025
- Asml Netherlands B V
- leading assignee (2,290)
- -18%
- grant velocity, last 5 yrs
How G03F's grant cadence moved
Between 2020–2024, G03F recorded 8,697 grants versus 10,593 in 2015–2019 (-18% equal-window velocity). Across complete years, output peaked in 2015 at 2,242 grants and bottomed in 2024 at 1,583 (+42% peak-over-trough). Lead assignee Asml Netherlands B.V. holds 10.6% of the class ; the top three share 24.7%.
Leaderboard read
G03F concentration, lead at 10.6%
Asml Netherlands B.V. leads this historical grant record at 10.6% of G03F - foreign corporation assignees hold 84% of class grants (13,984 of 16,675). Figures describe granted US utility patents in this CPC subclass, not current investment or legal strength.
- Leader's share
- 10.6%
- Top three share
- 24.7%
- Lead over #2
- 272
2,290 of 21,670 grants
of the class's recorded grants
more grants than Taiwan Semiconductor Manufacturing Company Ltd.
Where G03F sits inside G03
Among 6 subclasses in G03 (PHOTOGRAPHY; CINEMATOGRAPHY; Analogous Techniques Using Waves Other Than Optical WAVES; ELECTROGRAPHY; Holography), G03F ranks #3 and holds 29.6% of the parent class's 73,096 recorded grants. Sibling chips below are the other subclasses in the same parent class, not the nationwide volume/lead-share peers further down.
Rising assignees active in G03F
Company-wide grant multiples (2022–2024 vs 2019–2021) among assignees with ≥5 patents in this subclass. Growth is company-wide; class patent counts are subclass-specific.
- #1 Changxin Memory Technologies, Inc. 63x 17 → 1,066 company-wide · 63 in G03F
- #2 Tsmc Nanjing Company, Limited 21x 3 → 62 company-wide · 5 in G03F
- #3 Auros Technology, Inc. 19x 0 → 19 company-wide · 13 in G03F
- #4 Nova Ltd. 18x 2 → 36 company-wide · 22 in G03F
- #5 Kioxia Corporation 11x 180 → 2,031 company-wide · 79 in G03F
G03F grants by year, peak 2015 (2,242)
US utility-patent grants per year in G03F, 2015–2025 - recent five years are down 18% versus 2015–2019.
Who leads G03F?
The 12 most active assignees in Photomechanical Production OF Textured OR Patterned Surfaces, e.g. FOR Printing, FOR Processing OF Semiconductor DEVICES; Materials THEREFOR; Originals THEREFOR; Apparatus Specially Adapted THEREFOR; - wider bars mean more grants
- Asml Netherlands B V
Asml Netherlands B.V.
2,290 patents
- Taiwan Semiconductor…
Taiwan Semiconductor Manufacturing Company Ltd.
2,018 patents
- Canon
Canon Kabushiki Kaisha
1,041 patents
- Carl Zeiss Smt
Carl Zeiss SMT GmbH
919 patents
- Nikon 674
Nikon Corporation
674 patents
- Shin-etsu Chemical 665
Shin-etsu Chemical Co., Ltd.
665 patents
- Fujifilm 593
Fujifilm Corporation
593 patents
- Tokyo Electron 451
Tokyo Electron Limited
451 patents
- Applied Materials 388
Applied Materials, Inc.
388 patents
- Kla-tencor 379
Kla-tencor Corporation
379 patents
- Boe Technology Group 358
BOE Technology Group Co., Ltd.
358 patents
- Tokyo Ohka Kogyo 274
Tokyo Ohka Kogyo Co., Ltd.
274 patents
What this shows Asml Netherlands B V is the most active filer in G03F, holding 2,290 of the 21,670 patents in this class. Concentration at the top signals how contestable this technology area is for new entrants.
View data table
| Rank | Company | Patents in G03F |
|---|---|---|
| #1 | Asml Netherlands B.V. | 2,290 |
| #2 | Taiwan Semiconductor Manufacturing Company Ltd. | 2,018 |
| #3 | Canon Kabushiki Kaisha | 1,041 |
| #4 | Carl Zeiss SMT GmbH | 919 |
| #5 | Nikon Corporation | 674 |
| #6 | Shin-etsu Chemical Co., Ltd. | 665 |
| #7 | Fujifilm Corporation | 593 |
| #8 | Tokyo Electron Limited | 451 |
| #9 | Applied Materials, Inc. | 388 |
| #10 | Kla-tencor Corporation | 379 |
| #11 | BOE Technology Group Co., Ltd. | 358 |
| #12 | Tokyo Ohka Kogyo Co., Ltd. | 274 |
| #13 | Rohm and Haas Electronic Materials LLC | 225 |
| #14 | Gigaphoton Inc. | 219 |
| #15 | KLA Corporation | 198 |
| #16 | Asml Holding N.V. | 198 |
| #17 | JSR Corporation | 190 |
| #18 | Hoya Corporation | 178 |
| #19 | GlobalFoundries Inc. | 169 |
| #20 | Sumitomo Chemical Company, Limited | 145 |
Footprint here vs. claim strategy
Each dot is a leading G03F assignee, placed by how many patents it holds in this class (horizontal) against its company-wide average claims per patent (vertical) - a read on whether the class is led by broad-but-shallow filers or focused deep-claim players.
Classes near G03F's 21,670-grant footprint
Nationwide nearest neighbors for G03F (#94 of 670 by volume ; lead share 10.6%) - not the G03 parent-class siblings above.
Nearest by grant volume
Nearest by lead-assignee share
Questions about G03F
Which company holds the most patents in G03F?
Which G03F assignees grew fastest recently?
How does G03F compare inside parent class G03?
What to do with this data
G03F in context - here's where to go next.
- Asml Netherlands B.V. leads G03F with 2,290 grants in this class. See full portfolio
- G03F ranks #94 of 670 by grant volume among all tracked CPC technology areas. See the ranking
- Inside parent class G03, the largest sibling subclass is G03G with 26,691 grants. Explore G03G
Figures reflect USPTO PatentsView grant data through 2026-05-15; pending applications not yet granted are not counted.
Methodology - G03F figures are USPTO PatentsView granted-utility totals for this subclass (21,670 grants in the tracked window).
Every figure on PlainPatent is rendered directly from USPTO source data, no number is typed in by an editor. This page draws directly on USPTO source data, no figure is typed in by an editor. See our editorial standards & corrections policy, the methodology behind these numbers, or report a data error.