Where does Shin-etsu Chemical Co., Ltd. rank among US patent assignees?

According to USPTO PatentsView (2015–2025 granted utility patents), Shin-etsu Chemical Co., Ltd. ranks #180 of 49,997 assignees by granted-patent volume, the same sort as the companies listing and top-holders ranking. See /methodology/#corpus-placement.

How many patents does Shin-etsu Chemical Co., Ltd. hold?

Shin-etsu Chemical Co., Ltd. holds 2,184 US utility patents granted between 2015 and 2025, spanning 192 technology areas.

What is Shin-etsu Chemical Co., Ltd.'s Innovation Score?

Shin-etsu Chemical Co., Ltd. has an Innovation Score of 64.3 out of 100 (top 2% of the corpus). This composite metric weighs portfolio volume (40%), grant velocity (20%), technology breadth (25%), and claim depth (15%).

Is Shin-etsu Chemical Co., Ltd.'s patent grant rate increasing or decreasing?

Shin-etsu Chemical Co., Ltd.'s recent grant velocity is -4% compared to the prior five-year period (grant years, not application filing dates). Grant activity has slowed relative to earlier years.

What does claim depth mean for Shin-etsu Chemical Co., Ltd.'s patents?

Shin-etsu Chemical Co., Ltd.'s patents average 11.1 claims each. This is an aggregate descriptive count from the grant record; it does not establish claim scope, legal strength, enforceability, or design-around risk.

How is the Shin-etsu Chemical Co., Ltd. patent data sourced?

All patent data comes from USPTO PatentsView, a public research dataset maintained by the United States Patent and Trademark Office covering US granted utility patents from 2015 to 2025.

USPTO 2015–2025 USPTO PatentsView Foreign Corporation

Shin-etsu Chemical Co., Ltd.

Q: What technology areas does Shin-etsu Chemical Co., Ltd. focus on?

Shin-etsu Chemical Co., Ltd.'s top technology area is G03F (Photomechanical Production OF Textured OR Patterned Surfaces, e.g. FOR Printing, FOR Processing OF Semiconductor DEVICES; Materials THEREFOR; Originals THEREFOR; Apparatus Specially Adapted THEREFOR;) with 665 patents, ranking #6 of 595 assignees active in that subclass. Grants appear in 192 CPC subclasses total.

USPTO PatentsView assignee record - 2,184 granted patents across 192 technology areas, recorded in grant years 2015–2025. Grant-trend analysis is cross-referenced to USPTO Patent Public Search; it does not measure application filings, current R&D, or legal strength. Primary class: G03F (Photomechanical Production OF Textured OR Patterned Surfaces, e.g. FOR Printing, FOR Processing OF Semiconductor DEVICES; Materials THEREFOR; Originals THEREFOR; Apparatus Specially Adapted THEREFOR;).

Compiled by PlainPatent · May 15, 2026

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Explore the portfolio See the ranking

The verdict

According to USPTO PatentsView, Shin-etsu ranks #180 of 49,997 tracked US assignees by granted-patent volume, with 2,184 patents across 192 technology areas.

#180
of 49,997 US assignees by volume: Top 2%
by Innovation Score (64.3/100): 11.1
avg claims per patent: -4%
grant velocity, last 5 yrs

USPTO PatentsView assignee plate

Corpus R180 · Foreign Corporation #180 · 2,184 grants

GRANTS-LARGE · TOP-DECILE · PHOTO-FINISH · CPC-WIDE · INNOV-STRONG · CLAIMS-PAR · TYPE-FRNCORP · VEL-FLAT · BOOK-FULL

GRANTS-LARGE 2.2K grants
TOP-DECILE #180/49,997
PHOTO-FINISH Jaguar Land Rover
CPC-WIDE G03F · 192 areas
INNOV-STRONG 64.3/100
CLAIMS-PAR 11.1 claims/avg
TYPE-FRNCORP Foreign Corp
VEL-FLAT -4% vel
BOOK-FULL 10/10 fields

Nearest grant-volume peer: Jaguar Land Rover Limited (±2 grants)

Instrument codes from this assignee’s USPTO PatentsView grant sheet: volume band, corpus rank, photo-finish peer, lead CPC, Innovation Score, claim depth, assignee type, velocity, and book completeness. Not a USPTO rating of patent strength.

How Shin-etsu’s 64.3 Innovation Score adds up

The same four weighted components behind every Innovation Score on PlainPatent: portfolio volume, grant velocity, technology breadth, and claim depth.

Volume 26.6 pts (41%) Velocity 6.1 pts (9%) Breadth 25.0 pts (39%) Claim depth 6.6 pts (10%)

Qualcomm Incorporated · highest

85
Elwha · near

64
Mahle International · near

64
The Regents of the… · near

64
Shin-etsu Chemical · this assignee

64
Beijing BOE Display… · near

64
3D Lighting… · lowest

7

What this shows Shin-etsu's Innovation Score is 64.3/100 (top 2% of the PatentsView-derived corpus). The chart places that score against the nearest Innovation Score peers plus corpus poles, not a reprint of the volume ranking.

Does more volume mean deeper claims for Shin-etsu?

Each dot is one of Shin-etsu’s 8 nearest volume peers (same corpus rank neighbourhood as the chart above), placed by total granted patents (horizontal) against average claims per patent (vertical). Shin-etsu’s own 11.1 claims/patent is at or below the 15.1 median for these volume peers. Volume here does not track with deeper claims; several lower-volume peers claim more thoroughly per patent.

Shin-etsu vs its 8 nearest volume peers: granted patents vs average claims per patent. Source: USPTO PatentsView.

How Shin-etsu's grant cadence moved

Between 2020–2024, Shin-etsu Chemical Co., Ltd. received 1,006 grants versus 1,051 in 2015–2019 (-4% equal-window velocity, above median growth). Across complete PatentsView years, output peaked in 2020 at 251 grants and bottomed in 2019 at 176. Lead class G03F accounts for 30.4% of the portfolio across 192 subclasses. Volume neighbours: Sumitomo Rubber Industries, Ltd. (#176) and Alcatel Lucent (#184).

Shin-etsu's three-year grant acceleration

From 2019–2021 to 2022–2024, Shin-etsu Chemical Co., Ltd. moved from 616 to 566 grants (0.92x the prior three-year total, a multiple, not a CAGR). Among 3,296 tracked assignees with ≥100 grants and ≥20 prior-period grants, that multiple ranks #1,414. See the growth leaderboard.

Sumitomo Rubber I…

2,232
Daikin Industries

2,229
Visa Internationa…

2,222
Cilag Internation…

2,210
Shin-etsu Chemical ◀

2,184
Jaguar Land Rover

2,182
Rolls-royce

2,152
Nokia Solutions A…

2,149
Alcatel Lucent

2,140

What this shows Shin-etsu holds 2,184 patents at rank #180, shown against the 8 assignees closest to it in grant volume rather than the industry's largest filers.

Companies ranked near Shin-etsu

By rank, the assignees closest to #180 in granted patent volume.

Leaders in G03F (Photomechanical Production OF Textured OR Patterned Surfaces)

Other assignees with the most granted patents in Shin-etsu's primary technology class.

Assignees with similar portfolio profiles

Two PlainPatent-derived peer sets for Shin-etsu, neither rank-band nor same-CPC leaders (those blocks stay above). In G03F (Photomechanical Production OF Textured OR Patterned Surfaces), Shin-etsu ranks #6 of 595 assignees by patent count in that subclass.

Similar innovation score

Nearest assignees by Innovation Score (64 here).

The Regents of the University of Colorado, a Body Corporate 64 Beijing BOE Display Technology Co., Ltd. 64 Mahle International GmbH 64 Elwha LLC 64

Similar claim depth

Nearest assignees by average claims per patent (11.1 here).

Seiko Epson Corporation 11.1 avg Universite Paul SABATIER—TOULOUSE III 11.1 avg Canon Denshi Kabushiki Kaisha 11.1 avg Jing-jin Electric Technologies Co., Ltd. 11.1 avg

Shin-etsu's Innovation Score vs. every tracked assignee

Composite of portfolio volume, grant velocity, technology breadth, and claim depth (0–100)

64 Top 2% higher than 98% of 49,997 US assignees

Each bar is a band; taller bars hold more US assignees. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.

Source USPTO PatentsView, PlainPatent Innovation Score · 2015–2025

USPTO utility patent grants by year · 2015–2025

Grants by year

Teal-shaded recent years (2020–present) versus the 2015–2019 baseline. Full figures in the table below.

View data table

Shin-etsu Chemical Co., Ltd. patent grants by year, 2015–2025
Year	Patents Granted	Share of Period
2015	234	10.7%
2016	210	9.6%
2017	223	10.2%
2018	208	9.5%
2019	176	8.1%
2020	251	11.5%
2021	189	8.7%
2022	189	8.7%
2023	185	8.5%
2024	192	8.8%
2025partial year	127	5.8%

Which technologies does Shin-etsu Chemical Co., Ltd. patent most?

G03F - Photomechanical Production OF Textured OR Patterned Surfaces, e.g. FOR Printing, FOR Processing OF Semiconductor DEVICES; Materials THEREFOR; Originals THEREFOR; Apparatus Specially Adapted THEREFOR; 665

C08G - Macromolecular Compounds Obtained Otherwise Than BY Reactions Only Involving Unsaturated Carbon-to-carbon Bonds 607

C08L - Compositions OF Macromolecular Compounds 469

C09D - Coating Compositions, e.g. Paints, Varnishes OR LACQUERS; Filling PASTES; Chemical Paint OR INK REMOVERS; INKS; Correcting FLUIDS; WOODSTAINS; Pastes OR Solids FOR Colouring OR PRINTING; USE OF Materials Therefor 386

H01L - Semiconductor Devices NOT Covered BY Class H10 359

C08K - Use of inorganic or non-macromolecular organic substances as compounding ingredients 352

C08F - Macromolecular Compounds Obtained BY Reactions Only Involving Carbon-to-carbon Unsaturated Bonds 306

C07C - Acyclic OR Carbocyclic Compounds 226

Y02E - Reduction OF Greenhouse GAS [GHG] Emissions, Related TO Energy Generation, Transmission OR Distribution 157

C09J - ADHESIVES; Non-mechanical Aspects OF Adhesive Processes IN GENERAL; Adhesive Processes NOT Provided FOR ELSEWHERE; USE OF Materials AS Adhesives 152

C07F - Acyclic, Carbocyclic OR Heterocyclic Compounds Containing Elements Other Than Carbon, Hydrogen, Halogen, Oxygen, Nitrogen, Sulfur, Selenium OR Tellurium 144

C09K - Materials FOR Miscellaneous Applications, NOT Provided FOR Elsewhere 113

C08J - WORKING-UP; General Processes OF COMPOUNDING; After-treatment NOT Covered BY Subclasses C08b, C08c, C08f, C08g or C08h 108

Y02P - Climate Change Mitigation Technologies IN THE Production OR Processing OF Goods 108

Y10T - Technical Subjects Covered BY Former US Classification 101

Top 15 of 192 technology areas

More on this record

Data Source

USPTO PatentsView, US granted patents 2015–2025

View all rankings → How is Innovation Score calculated?

What to do with this data

Shin-etsu Chemical Co., Ltd.'s patent record in context - here's where to go next.

Shin-etsu Chemical Co., Ltd.'s lead technology class is G03F (Photomechanical Production OF Textured OR Patterned Surfaces, e.g. FOR Printing, FOR Processing OF Semiconductor DEVICES; Materials THEREFOR; Originals THEREFOR; Apparatus Specially Adapted THEREFOR;), 30.4% of its portfolio - see every assignee active in that class. Explore G03F
Ranked #180 of 49,997 tracked assignees by patent volume - see the full leaderboard. See the ranking
Compare Shin-etsu Chemical Co., Ltd. against Sumitomo Rubber Industries, Ltd., an assignee filing at a similar volume. Compare portfolios
Innovation Score of 64.3/100 blends volume, velocity, technology breadth, and claim depth. How it's calculated

Figures reflect USPTO PatentsView grant data through May 2026; pending applications not yet granted are not counted.

Data sourced from USPTO PatentsView - official U.S. government patent data. See our methodology for computation details. Retrieved and formatted by PlainPatent

Disclaimer: This information is provided for informational purposes only and does not constitute professional advice. Data is sourced from the USPTO PatentsView database. Consult a qualified professional before making decisions based on this data.

Read our methodology - how this data is sourced, computed, and verified.

Data sources used on this page

USPTO PatentsView - the disambiguated bulk patent-grant, assignee, and CPC data this page's figures are derived from. patentsview.org
Cooperative Patent Classification (CPC) - the joint USPTO/EPO classification scheme used to group patents by technology area. cooperativepatentclassification.org
USPTO Patent Public Search - the official interface to verify the status of any individual patent. ppubs.uspto.gov

Compiled by PlainPatent , US Patent Intelligence Editorial Process · May 15, 2026

Every figure on PlainPatent is rendered directly from USPTO source data, no number is typed in by an editor. This page draws directly on USPTO source data, no figure is typed in by an editor. See our editorial standards & corrections policy, the methodology behind these numbers, or report a data error. Data current as of May 2026.