Where does Rave LLC rank among US patent assignees?

According to USPTO PatentsView (2015–2025 granted utility patents), Rave LLC ranks #42,580 of 49,997 assignees by granted-patent volume, the same sort as the companies listing and top-holders ranking. See /methodology/#corpus-placement.

How many patents does Rave LLC hold?

Rave LLC holds 6 US utility patents granted between 2015 and 2019, spanning 5 technology areas.

What is Rave LLC's Innovation Score?

Rave LLC has an Innovation Score of 23.8 out of 100 (13th percentile of the corpus). This composite metric weighs portfolio volume (40%), grant velocity (20%), technology breadth (25%), and claim depth (15%).

Is Rave LLC's patent grant rate increasing or decreasing?

Rave LLC's recent grant velocity is -100% compared to the prior five-year period (grant years, not application filing dates). Grant activity has slowed relative to earlier years.

What does claim depth mean for Rave LLC's patents?

Rave LLC's patents average 15.3 claims each. This is an aggregate descriptive count from the grant record; it does not establish claim scope, legal strength, enforceability, or design-around risk.

How is the Rave LLC patent data sourced?

All patent data comes from USPTO PatentsView, a public research dataset maintained by the United States Patent and Trademark Office covering US granted utility patents from 2015 to 2025.

USPTO 2015–2025 USPTO PatentsView US Corporation

Rave LLC

Q: What technology areas does Rave LLC focus on?

Rave LLC's top technology area is G03F (Photomechanical Production OF Textured OR Patterned Surfaces, e.g. FOR Printing, FOR Processing OF Semiconductor DEVICES; Materials THEREFOR; Originals THEREFOR; Apparatus Specially Adapted THEREFOR;) with 6 patents. Grants appear in 5 CPC subclasses total.

USPTO PatentsView assignee record - 6 granted patents across 5 technology areas, recorded in grant years 2015–2019. Grant-trend analysis is cross-referenced to USPTO Patent Public Search; it does not measure application filings, current R&D, or legal strength. Primary class: G03F (Photomechanical Production OF Textured OR Patterned Surfaces, e.g. FOR Printing, FOR Processing OF Semiconductor DEVICES; Materials THEREFOR; Originals THEREFOR; Apparatus Specially Adapted THEREFOR;).

Compiled by PlainPatent · May 15, 2026

RSS updates for this company

Explore the portfolio See the ranking

The verdict

According to USPTO PatentsView, Rave ranks #42,580 of 49,997 tracked US assignees by granted-patent volume, with 6 patents across 5 technology areas.

#42,580
of 49,997 US assignees by volume: 13th percentile
by Innovation Score (23.8/100): 15.3
avg claims per patent: -100%
grant velocity, last 5 yrs

USPTO PatentsView assignee plate

Corpus R42580 · US Corporation #42,580 · 6 grants

GRANTS-MICRO · LOWER-Q · PHOTO-FINISH · CPC-NARROW · INNOV-THIN · CLAIMS-RICH · TYPE-USCORP · VEL-DROP · BOOK-FULL

GRANTS-MICRO 6 grants
LOWER-Q #42,580/49,997
PHOTO-FINISH RAM Group
CPC-NARROW G03F · 5 areas
INNOV-THIN 23.8/100
CLAIMS-RICH 15.3 claims/avg
TYPE-USCORP US Corporation
VEL-DROP -100% vel
BOOK-FULL 10/10 fields

Nearest grant-volume peer: RAM Group, Inc. (±0 grants)

Instrument codes from this assignee’s USPTO PatentsView grant sheet: volume band, corpus rank, photo-finish peer, lead CPC, Innovation Score, claim depth, assignee type, velocity, and book completeness. Not a USPTO rating of patent strength.

Qualcomm Incorporated · highest

85
Rave · this assignee

24
3D Lighting… · lowest

7

What this shows Rave's Innovation Score is 23.8/100 (13th percentile of the PatentsView-derived corpus). The chart places that score against the nearest Innovation Score peers plus corpus poles, not a reprint of the volume ranking.

Where Rave's grants concentrate

Rave LLC is a focused PatentsView assignee: 5 CPC subclasses with 100% of grants classified under G03F (Photomechanical Production OF Textured OR Patterned Surfaces, e.g. FOR Printing, FOR Processing OF Semiconductor DEVICES; Materials THEREFOR; Originals THEREFOR; Apparatus Specially Adapted THEREFOR;). Peak complete grant year is 2019 (2 grants) versus a trough of 1 in 2015. By volume, Rave sits between RAM Group, Inc. and Ready Grip Technologies, Inc..

RAM Group

6
Ramun Korea

6
Rapid Granulator…

6
Rassini Frenos DE…

6
Raymor Industries

6
RCF S P A

6
RDM

6
Ready Grip

6
Rave ◀

6

What this shows Rave holds 6 patents at rank #42,539, shown against the 8 assignees closest to it in grant volume rather than the industry's largest filers.

Companies ranked near Rave

By rank, the assignees closest to #42,539 in granted patent volume.

Leaders in G03F (Photomechanical Production OF Textured OR Patterned Surfaces)

Other assignees with the most granted patents in Rave's primary technology class.

Rave's Innovation Score vs. every tracked assignee

Composite of portfolio volume, grant velocity, technology breadth, and claim depth (0–100)

24 13th percentile higher than 13% of 49,997 US assignees

Each bar is a band; taller bars hold more US assignees. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.

Source USPTO PatentsView, PlainPatent Innovation Score · 2015–2025

USPTO utility patent grants by year · 2015–2019

Grants by year

Teal-shaded recent years (2020–present) versus the 2015–2019 baseline. Full figures in the table below.

View data table

Rave LLC patent grants by year, 2015–2025
Year	Patents Granted	Share of Period
2015	1	16.7%
2016	1	16.7%
2017	1	16.7%
2018	1	16.7%
2019	2	33.3%

Which technologies does Rave LLC patent most?

G03F - Photomechanical Production OF Textured OR Patterned Surfaces, e.g. FOR Printing, FOR Processing OF Semiconductor DEVICES; Materials THEREFOR; Originals THEREFOR; Apparatus Specially Adapted THEREFOR; 6

B08B - Cleaning IN GENERAL; Prevention OF Fouling IN General 5

Y10S - Technical Subjects Covered BY Former Uspc Cross-reference ART Collections [XRACs] AND Digests 3

G01Q - Scanning-probe Techniques OR APPARATUS; Applications OF Scanning-probe Techniques, e.g. Scanning Probe Microscopy [SPM] 2

G01N - Investigating OR Analysing Materials BY Determining Their Chemical OR Physical Properties 1

Top 5 of 5 technology areas

Where it ranks

Overall rank by patents

#42,580

of 49,997 tracked assignees

Innovation Score

23.8 out of 100

View all rankings →

Data Source

USPTO PatentsView, US granted patents 2015–2025

How is Innovation Score calculated?

What to do with this data

Rave LLC's patent record in context - here's where to go next.

Rave LLC's lead technology class is G03F (Photomechanical Production OF Textured OR Patterned Surfaces, e.g. FOR Printing, FOR Processing OF Semiconductor DEVICES; Materials THEREFOR; Originals THEREFOR; Apparatus Specially Adapted THEREFOR;), 100% of its portfolio - see every assignee active in that class. Explore G03F
Ranked #42,580 of 49,997 tracked assignees by patent volume - see the full leaderboard. See the ranking
Compare Rave LLC against RAM Group, Inc., an assignee filing at a similar volume. Compare portfolios
Innovation Score of 23.8/100 blends volume, velocity, technology breadth, and claim depth. How it's calculated

Figures reflect USPTO PatentsView grant data through May 2026; pending applications not yet granted are not counted.

Data sourced from USPTO PatentsView - official U.S. government patent data. See our methodology for computation details. Retrieved and formatted by PlainPatent

Disclaimer: This information is provided for informational purposes only and does not constitute professional advice. Data is sourced from the USPTO PatentsView database. Consult a qualified professional before making decisions based on this data.

Read our methodology - how this data is sourced, computed, and verified.

Data sources used on this page

USPTO PatentsView - the disambiguated bulk patent-grant, assignee, and CPC data this page's figures are derived from. patentsview.org
Cooperative Patent Classification (CPC) - the joint USPTO/EPO classification scheme used to group patents by technology area. cooperativepatentclassification.org
USPTO Patent Public Search - the official interface to verify the status of any individual patent. ppubs.uspto.gov

Compiled by PlainPatent, US Patent Intelligence Editorial Process · May 15, 2026

Every figure on PlainPatent is rendered directly from USPTO source data, no number is typed in by an editor. This page draws directly on USPTO source data, no figure is typed in by an editor. See our editorial standards & corrections policy, the methodology behind these numbers, or report a data error. Data current as of May 2026.