Where does NEW Power Plasma Co., Ltd. rank among US patent assignees?

According to USPTO PatentsView (2015–2025 granted utility patents), NEW Power Plasma Co., Ltd. ranks #17,032 of 49,997 assignees by granted-patent volume, the same sort as the companies listing and top-holders ranking. See /methodology/#corpus-placement.

How many patents does NEW Power Plasma Co., Ltd. hold?

NEW Power Plasma Co., Ltd. holds 17 US utility patents granted between 2015 and 2025, spanning 14 technology areas.

What is NEW Power Plasma Co., Ltd.'s Innovation Score?

NEW Power Plasma Co., Ltd. has an Innovation Score of 33.2 out of 100 (44th percentile of the corpus). This composite metric weighs portfolio volume (40%), grant velocity (20%), technology breadth (25%), and claim depth (15%).

What technology areas does NEW Power Plasma Co., Ltd. focus on?

NEW Power Plasma Co., Ltd.'s top technology area is H01J (Electric Discharge Tubes OR Discharge Lamps) with 12 patents, ranking #171 of 1,076 assignees active in that subclass. Grants appear in 14 CPC subclasses total.

Is NEW Power Plasma Co., Ltd.'s patent grant rate increasing or decreasing?

NEW Power Plasma Co., Ltd.'s recent grant velocity is -50% compared to the prior five-year period (grant years, not application filing dates). Grant activity has slowed relative to earlier years.

What does claim depth mean for NEW Power Plasma Co., Ltd.'s patents?

NEW Power Plasma Co., Ltd.'s patents average 13.5 claims each. This is an aggregate descriptive count from the grant record; it does not establish claim scope, legal strength, enforceability, or design-around risk.

How is the NEW Power Plasma Co., Ltd. patent data sourced?

All patent data comes from USPTO PatentsView, a public research dataset maintained by the United States Patent and Trademark Office covering US granted utility patents from 2015 to 2025.

USPTO 2015–2025 USPTO PatentsView Foreign Corporation

NEW Power Plasma Co., Ltd.

USPTO PatentsView assignee record - 17 granted patents across 14 technology areas, recorded in grant years 2015–2025. Grant-trend analysis is cross-referenced to USPTO Patent Public Search; it does not measure application filings, current R&D, or legal strength. Primary class: H01J (Electric Discharge Tubes OR Discharge Lamps).

Compiled by PlainPatent · May 15, 2026

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The verdict

According to USPTO PatentsView, NEW ranks #17,032 of 49,997 tracked US assignees by granted-patent volume, with 17 patents across 14 technology areas.

#17,032
of 49,997 US assignees by volume: 44th percentile
by Innovation Score (33.2/100): 13.5
avg claims per patent: -50%
grant velocity, last 5 yrs

USPTO PatentsView assignee plate

Corpus R17032 · Foreign Corporation #17,032 · 17 grants

GRANTS-MICRO · MID-PACK · PHOTO-FINISH · CPC-FOCUS · INNOV-THIN · CLAIMS-RICH · TYPE-FRNCORP · VEL-DROP · BOOK-FULL

GRANTS-MICRO 17 grants
MID-PACK #17,032/49,997
PHOTO-FINISH Neuboron Therapy…
CPC-FOCUS H01J · 14 areas
INNOV-THIN 33.2/100
CLAIMS-RICH 13.5 claims/avg
TYPE-FRNCORP Foreign Corp
VEL-DROP -50% vel
BOOK-FULL 10/10 fields

Nearest grant-volume peer: Neuboron Therapy System Ltd. (±0 grants)

Instrument codes from this assignee’s USPTO PatentsView grant sheet: volume band, corpus rank, photo-finish peer, lead CPC, Innovation Score, claim depth, assignee type, velocity, and book completeness. Not a USPTO rating of patent strength.

How NEW’s 33.2 Innovation Score adds up

The same four weighted components behind every Innovation Score on PlainPatent: portfolio volume, grant velocity, technology breadth, and claim depth.

Volume 10.0 pts (30%) Velocity 1.9 pts (6%) Breadth 13.2 pts (40%) Claim depth 8.1 pts (24%)

Qualcomm Incorporated · highest

85
NEW Power Plasma · this assignee

33
3D Lighting… · lowest

7

What this shows NEW's Innovation Score is 33.2/100 (44th percentile of the PatentsView-derived corpus). The chart places that score against the nearest Innovation Score peers plus corpus poles, not a reprint of the volume ranking.

Does more volume mean deeper claims for NEW?

Each dot is one of NEW’s 8 nearest volume peers (same corpus rank neighbourhood as the chart above), placed by total granted patents (horizontal) against average claims per patent (vertical). NEW’s own 13.5 claims/patent is at or below the 17.5 median for these volume peers. Volume here does not track with deeper claims; several lower-volume peers claim more thoroughly per patent.

NEW vs its 8 nearest volume peers: granted patents vs average claims per patent. Source: USPTO PatentsView.

Where NEW's grants concentrate

NEW Power Plasma Co., Ltd. is a focused PatentsView assignee: 14 CPC subclasses with 70.6% of grants classified under H01J (Electric Discharge Tubes OR Discharge Lamps). Peak complete grant year is 2015 (5 grants) versus a trough of 1 in 2017. By volume, NEW sits between Neuboron Therapy System Ltd. and Nexus Photonics, Inc.

NEW's three-year grant acceleration

NEW Power Plasma Co., Ltd. shows 2 grants in 2022–2024 against only 7 in 2019–2021. That prior window is too thin for a growth multiple (rename and spin-out assignees look artificially high when the baseline is near zero), so PlainPatent withholds a ranked acceleration claim here.

Neuboron Therapy…

17
Neuracle Science

17
Neuro Kinetics

17
Neuspera Medical

17
NEX Services Nort…

17
Nexon Korea

17
Next Carbon Solut…

17
Nexus Photonics

17
NEW Power Plasma ◀

17

What this shows NEW holds 17 patents at rank #17,018, shown against the 8 assignees closest to it in grant volume rather than the industry's largest filers.

Companies ranked near NEW

By rank, the assignees closest to #17,018 in granted patent volume.

Leaders in H01J (Electric Discharge Tubes OR Discharge Lamps)

Other assignees with the most granted patents in NEW's primary technology class.

NEW's Innovation Score vs. every tracked assignee

Composite of portfolio volume, grant velocity, technology breadth, and claim depth (0–100)

33 44th percentile higher than 44% of 49,997 US assignees

Each bar is a band; taller bars hold more US assignees. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.

Source USPTO PatentsView, PlainPatent Innovation Score · 2015–2025

USPTO utility patent grants by year · 2015–2025

Grants by year

Teal-shaded recent years (2020–present) versus the 2015–2019 baseline. Full figures in the table below.

View data table

NEW Power Plasma Co., Ltd. patent grants by year, 2015–2025
Year	Patents Granted	Share of Period
2015	5	29.4%
2017	1	5.9%
2019	4	23.5%
2020	2	11.8%
2021	1	5.9%
2023	1	5.9%
2024	1	5.9%
2025partial year	2	11.8%

Which technologies does NEW Power Plasma Co., Ltd. patent most?

H01J - Electric Discharge Tubes OR Discharge Lamps 12

H02M - Apparatus FOR Conversion Between AC AND AC, Between AC AND DC, OR Between DC AND DC, AND FOR USE With Mains OR Similar Power Supply SYSTEMS; Conversion OF DC OR AC Input Power Into Surge Output POWER; Control OR Regulation Thereof 4

H05H - Plasma Technique ; Production OF Accelerated Electrically-charged Particles OR OF NEUTRONS; Production OR Acceleration OF Neutral Molecular OR Atomic Beams 4

G01R - Measuring Electric VARIABLES; Measuring Magnetic Variables 3

H01L - Semiconductor Devices NOT Covered BY Class H10 3

H01F - MAGNETS; INDUCTANCES; TRANSFORMERS; Selection OF Materials FOR Their Magnetic Properties 2

Y02B - Climate Change Mitigation Technologies Related TO Buildings, e.g. Housing, House Appliances OR Related End-user Applications 2

H03F - Amplifiers 2

H05K - Printed CIRCUITS; Casings OR Constructional Details OF Electric APPARATUS; Manufacture OF Assemblages OF Electrical Components 1

C23C - Coating Metallic MATERIAL; Coating Material With Metallic MATERIAL; Surface Treatment OF Metallic Material BY Diffusion Into THE Surface, BY Chemical Conversion OR SUBSTITUTION; Coating BY Vacuum Evaporation, BY Sputtering, BY ION Implantation OR BY Chemical Vapour Deposition, IN General 1

H03K - Pulse Technique 1

H03H - Impedance Networks, e.g. Resonant CIRCUITS; Resonators 1

F16K - VALVES; TAPS; COCKS; ACTUATING-FLOATS; Devices FOR Venting OR Aerating 1

Y10S - Technical Subjects Covered BY Former Uspc Cross-reference ART Collections [XRACs] AND Digests 1

Top 14 of 14 technology areas

More on this record

Data Source

USPTO PatentsView, US granted patents 2015–2025

View all rankings → How is Innovation Score calculated?

What to do with this data

NEW Power Plasma Co., Ltd.'s patent record in context - here's where to go next.

NEW Power Plasma Co., Ltd.'s lead technology class is H01J (Electric Discharge Tubes OR Discharge Lamps), 70.6% of its portfolio - see every assignee active in that class. Explore H01J
Ranked #17,032 of 49,997 tracked assignees by patent volume - see the full leaderboard. See the ranking
Compare NEW Power Plasma Co., Ltd. against Neuboron Therapy System Ltd., an assignee filing at a similar volume. Compare portfolios
Innovation Score of 33.2/100 blends volume, velocity, technology breadth, and claim depth. How it's calculated

Figures reflect USPTO PatentsView grant data through May 2026; pending applications not yet granted are not counted.

Data sourced from USPTO PatentsView - official U.S. government patent data. See our methodology for computation details. Retrieved and formatted by PlainPatent

Disclaimer: This information is provided for informational purposes only and does not constitute professional advice. Data is sourced from the USPTO PatentsView database. Consult a qualified professional before making decisions based on this data.

Read our methodology - how this data is sourced, computed, and verified.

Data sources used on this page

USPTO PatentsView - the disambiguated bulk patent-grant, assignee, and CPC data this page's figures are derived from. patentsview.org
Cooperative Patent Classification (CPC) - the joint USPTO/EPO classification scheme used to group patents by technology area. cooperativepatentclassification.org
USPTO Patent Public Search - the official interface to verify the status of any individual patent. ppubs.uspto.gov

Compiled by PlainPatent, US Patent Intelligence Editorial Process · May 15, 2026

Every figure on PlainPatent is rendered directly from USPTO source data, no number is typed in by an editor. This page draws directly on USPTO source data, no figure is typed in by an editor. See our editorial standards & corrections policy, the methodology behind these numbers, or report a data error. Data current as of May 2026.