PlainPatent

CPC technology class · H05

H05H - Plasma Technique

Plasma technique ; production of accelerated electrically-charged particles or of neutrons; production or acceleration of neutral molecular or atomic beams. 3,951 US utility patents granted 2015–2025, with the leading assignees and year-by-year filing trajectory.

3,951
US patents granted
H05
Parent CPC class
20
Active assignees
+12%
5-yr velocity

The verdict

Plasma Technique ranks #275 of 670 CPC technology areas - 3,951 US patents granted since 2015, with filing up 12% over five years.

#275
of 670 CPC technology areas
3,951
US patents granted, 2015–2025
Tokyo Electron
leading assignee (195)
+12%
filing velocity, last 5 yrs
Top assignee: Tokyo Electron Limited (195 patents)

CPC subclass H05H - PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS - covers 3,951 US utility patents granted between 2015 and 2025 according to USPTO PatentsView records, within the broader CPC class H05 (ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR). See our CPC classification guide for how the system works.

The competitive landscape in H05H is shaped by 20 distinct companies actively filing in this space. Tokyo Electron Limited leads with 195 patents, followed by Hypertherm, Inc. at 117 grants and Lam Research Corporation at 63.

Filing activity in H05H is up 12% over the past five years versus 2015-2019, a relatively steady filing pace. All counts come directly from USPTO PatentsView and reflect US granted utility patents only.

Is H05H innovation accelerating?

US utility-patent grants per year in H05H, 2015–2025 - recent five years are up 12% versus 2015–2019.

250300350400450 20152016201720182019202020212022202320242025 281

Who leads H05H?

The 12 most active assignees in PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS - wider bars mean more grants

patents

What this shows Tokyo Electron is the most active filer in H05H, holding 195 of the 3,951 patents in this class. Concentration at the top signals how contestable this technology area is for new entrants.

Source USPTO PatentsView, granted utility patents As of 2015–2025 grant years
View data table
Top patent holders in CPC subclass H05H
Rank Company Patents in H05H
#1 Tokyo Electron Limited 195
#2 Hypertherm, Inc. 117
#3 Lam Research Corporation 63
#4 TAE Technologies, Inc. 46
#5 Advanced Energy Industries, Inc. 39
#6 Lincoln Global, Inc. 31
#7 Mevion Medical Systems, Inc. 31
#8 Foret Plasma Labs, Llc 30
#9 Perkinelmer Health Sciences, Inc. 29
#10 Ion Beam Applications 28
#11 MKS Instruments, Inc. 27
#12 Hitachi High-tech Corporation 26
#13 Imagineering, Inc. 25
#14 Sumitomo Heavy Industries, Ltd. 24
#15 The ESAB Group, Inc. 23
#16 Plasmology4 23
#17 Jefferson Science Associates, Llc 22
#18 Neuboron Medtech Ltd. 21
#19 Varian Medical Systems, Inc. 20
#20 Cinogy Gmbh 20

About This Class

CPC subclass H05H belongs to class H05.

3,951 patents were granted in this class between 2015 and 2025.

20 companies actively patent in this space.

Classification System

Cooperative Patent Classification (CPC) is a hierarchical patent classification system used by the USPTO and EPO.

← All Technology Classes Technology Rankings →

Footprint here vs. claim strategy

Each dot is a leading H05H assignee, placed by how many patents it holds in this class (horizontal) against its company-wide average claims per patent (vertical) - a read on whether the class is led by broad-but-shallow filers or focused deep-claim players.

Top 14 H05H assignees by class footprint. Bubble size = patents in H05H. Source: USPTO PatentsView (claim depth is company-wide across all classes).

Top 14 H05H assignees by class footprint. Bubble size = patents in H05H. Source: USPTO PatentsView (claim depth is company-wide across all classes). Scatter plot of 14 data points (bubble-sized by third dimension). 010203040 050100150200250 Patents in H05H Avg claims / patent (company-wide) Tokyo ElectronHyperthermLam ResearchTaeAdvanced Energy Indus…Lincoln GlobalMevion Medical SystemsForet Plasma LabsPerkinelmer Health Sc…Ion Beam ApplicationsMks InstrumentsHitachi High-techImagineeringSumitomo Heavy Indust…
Top 14 H05H assignees by class footprint. Bubble size = patents in H05H. Source: USPTO PatentsView (claim depth is company-wide across all classes).

Frequently Asked Questions

What is CPC class H05H?
CPC subclass H05H covers PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS. It belongs to CPC class H05 (ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR), with 3,951 US utility patents granted since 2015.
How many patents have been filed in H05H?
3,951 US utility patents were granted in CPC subclass H05H between 2015 and 2025, based on USPTO PatentsView data.
Which company holds the most patents in H05H?
Tokyo Electron Limited leads H05H with 195 patents, making it the most active assignee in this technology area.
How is patent data for H05H collected?
Patent data comes from USPTO PatentsView, a public research dataset maintained by the United States Patent and Trademark Office. It covers all US granted utility patents and assigns CPC codes based on the technology described in each patent.
What is the difference between CPC class and subclass?
A CPC class (e.g., H05) is a broad technology category. Subclasses like H05H provide finer granularity within that category. PlainPatent organizes data at the subclass level (4-character codes) for the most useful view of technology domains.

Read our methodology - how this data is sourced, computed, and verified.

Data sourced from USPTO PatentsView - official U.S. government patent data. See our methodology for computation details. Retrieved and formatted by PlainPatent Editorial

Every figure on PlainPatent is rendered directly from USPTO source data, no number is typed in by an editor. This page draws directly on USPTO source data, no figure is typed in by an editor. See our editorial standards & corrections policy, the methodology behind these numbers, or report a data error.