PlainPatent
USPTO 2015–2025 USPTO PatentsView Foreign Corporation

Leibniz-institut Für Plasmaforschung UND Technologie E.v.

USPTO PatentsView assignee record - 18 granted patents across 23 technology areas, active 2015–2025. Filing-trend and competitive-moat analysis cross-referenced to USPTO Patent Public Search. Primary class: H05H (PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS).

Explore the portfolio See the ranking
18
Total patents granted
23
CPC technology areas
12.3
Avg claims per patent
+0%
5-year filing velocity

The verdict

Leibniz-institut holds 18 US patents across 23 technology areas, rank #16,155 of 50,000 tracked assignees.

#16,155
of 50,000 US assignees by volume
Top 41%
by Innovation Score (38.3/100)
12.3
avg claims per patent
+0%
filing velocity, last 5 yrs

Portfolio overview

Leibniz-institut Für Plasmaforschung UND Technologie E.v. has been granted 18 US utility patents between 2015 and 2025, placing Leibniz-institut Für Plasmaforschung UND Technologie E.v. at rank #16,155 across all assignees tracked by PlainPatent. This portfolio spans 23 distinct Cooperative Patent Classification (CPC) subclasses, averaging 12.3 claims per patent with primary concentration in H05H (PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS). As a Foreign Corporation, Leibniz-institut Für Plasmaforschung UND Technologie E.v. is one of the more focused assignees in the PatentsView dataset. By volume, Leibniz-institut sits between Landos Biopharma, Inc. (18 patents, rank #16,151) and Latch Systems, Inc. (18 patents, rank #16,159) - the closest US assignees by grant volume. The composite Innovation Score of 38.3/100 blends portfolio volume, filing velocity, technology breadth, and claim depth into a single comparable measure drawn directly from USPTO PatentsView records.

Filing cadence tells the strategic story. Between 2020 and 2025 the company received 9 grants, compared with 9 in the 2015–2019 window, a +0% shift in five-year velocity. Steady filing volume suggests sustained innovation without dramatic pivots. The Foreign Corporation classification further shapes interpretation, since corporate, government, and individual filers pursue patents for materially different reasons.

Claim depth and technology breadth together indicate competitive posture. Leibniz-institut Für Plasmaforschung UND Technologie E.v.'s 12.3 average claims per patent sits within the typical range for solid legal coverage without excessive prosecution cost, while a multi-domain presence across 23 subclasses balances depth with breadth. Combined with portfolio volume, these signals let analysts, investors, and licensing professionals benchmark Leibniz-institut Für Plasmaforschung UND Technologie E.v. against peers pursuing similar technology classes.

Who files at Leibniz-institut's volume?

Granted US patents 2015–2025 versus its nearest-ranked assignees by volume, this company marked ◀

patents

What this shows Leibniz-institut holds 18 patents at rank #16,155, shown against the 8 assignees closest to it in grant volume rather than the industry's largest filers.

Source USPTO PatentsView, granted utility patents As of 2015–2025

Companies ranked near Leibniz-institut

By rank, the assignees closest to #16,155 in granted patent volume.

Leaders in H05H (Plasma Technique)

Other assignees with the most granted patents in Leibniz-institut's primary technology class.

Leibniz-institut's Innovation Score vs. every tracked assignee

Composite of portfolio volume, filing velocity, technology breadth, and claim depth (0–100)

38 Top 41% higher than 59% of 50,000 US assignees

0–10: 687 US assignees (1%). Below this entry. 10–20: 2,527 US assignees (5%). Below this entry. 20–30: 13,162 US assignees (26%). Below this entry. 30–40: 15,294 US assignees (31%). This entry sits in this band. 40–50: 11,491 US assignees (23%). Above this entry. 50–60: 5,058 US assignees (10%). Above this entry. 60–70: 1,537 US assignees (3%). Above this entry. 70–80: 234 US assignees (0%). Above this entry. 80–90: 10 US assignees (0%). Above this entry. 90–100: 0 US assignees (0%). Above this entry. This assignee 0 100 every tracked assignee, bucketed by value

Each bar is a band; taller bars hold more US assignees. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.

Source USPTO PatentsView, PlainPatent Innovation Score · 2015–2025

012345 20152017201820192021202220232025 2
USPTO utility patent grants by year · 2015–2025

Grants by year

Teal-shaded recent years (2020–present) versus the 2015–2019 baseline. Full figures in the table below.

View data table
Leibniz-institut Für Plasmaforschung UND Technologie E.v. patent grants by year, 2015–2025
Year Patents Granted Share of Period
2015 2 11.1%
2017 2 11.1%
2018 1 5.6%
2019 4 22.2%
2021 3 16.7%
2022 1 5.6%
2023 3 16.7%
2025 2 11.1%

Which technologies does Leibniz-institut Für Plasmaforschung UND Technologie E.v. patent most?

Top 15 of 23 technology areas

Patent Moat Analysis

Portfolio Volume Light
Tech Breadth Multi-domain
Claim Depth Standard
Velocity Growing

Where it ranks

Overall rank by patents

#16,155

Across all tracked assignees

Innovation Score

38.3 out of 100

View all rankings →

Data Source

USPTO PatentsView, US granted patents 2015–2025

How is Innovation Score calculated?

Frequently Asked Questions

How many patents does Leibniz-institut Für Plasmaforschung UND Technologie E.v. hold?
Leibniz-institut Für Plasmaforschung UND Technologie E.v. holds 18 US granted patents filed between 2015 and 2025, spanning 23 technology areas.
What is Leibniz-institut Für Plasmaforschung UND Technologie E.v.'s Innovation Score?
Leibniz-institut Für Plasmaforschung UND Technologie E.v. has an Innovation Score of 38.3 out of 100. This composite metric weighs portfolio volume (40%), filing velocity (20%), technology breadth (25%), and claim depth (15%).
What technology areas does Leibniz-institut Für Plasmaforschung UND Technologie E.v. focus on?
Leibniz-institut Für Plasmaforschung UND Technologie E.v.'s top technology area is H05H (PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS) with 13 patents. The company has filed patents in 23 CPC subclasses total.
Is Leibniz-institut Für Plasmaforschung UND Technologie E.v.'s patent filing rate increasing or decreasing?
Leibniz-institut Für Plasmaforschung UND Technologie E.v.'s recent filing velocity is +0% compared to the prior five-year period. The company is maintaining or growing its patent output.
What does claim depth mean for Leibniz-institut Für Plasmaforschung UND Technologie E.v.'s patents?
Leibniz-institut Für Plasmaforschung UND Technologie E.v.'s patents average 12.3 claims each. This falls within the standard range, providing solid legal coverage.
How is the Leibniz-institut Für Plasmaforschung UND Technologie E.v. patent data sourced?
All patent data comes from USPTO PatentsView, a public research dataset maintained by the United States Patent and Trademark Office covering US granted utility patents from 2015 to 2025.

How to use this portfolio

Leibniz-institut's 18 grants land it in the top 41% by Innovation Score, but volume alone doesn't tell you where the strength sits.

  • Read that count against the largest US assignees before treating it as dominance - Leibniz-institut ranks #16,155 of 50,000. Top 50 holders
  • Most of this portfolio concentrates in H05H - see who else leads that technology area. H05H leaders
  • Check what the four-part Innovation Score actually rewards before comparing it to another company. How the score works

Patent counts and the Innovation Score measure patenting activity, not commercial success or the legal strength of any patent. Many patents are filed defensively. Verify the status of an individual patent against official USPTO records.

Data sourced from USPTO PatentsView - official U.S. government patent data. See our methodology for computation details. Retrieved and formatted by PlainPatent Editorial

Disclaimer: This information is provided for informational purposes only and does not constitute professional advice. Data is sourced from the USPTO PatentsView database. Consult a qualified professional before making decisions based on this data.

Read our methodology - how this data is sourced, computed, and verified.

Data sources used on this page
  • USPTO PatentsView - the disambiguated bulk patent-grant, assignee, and CPC data this page's figures are derived from. patentsview.org
  • Cooperative Patent Classification (CPC) - the joint USPTO/EPO classification scheme used to group patents by technology area. cooperativepatentclassification.org
  • USPTO Patent Public Search - the official interface to verify the status of any individual patent. ppubs.uspto.gov

Every figure on PlainPatent is rendered directly from USPTO source data, no number is typed in by an editor. This page draws directly on USPTO source data, no figure is typed in by an editor. See our editorial standards & corrections policy, the methodology behind these numbers, or report a data error. Data current as of May 2026.