Where does Instytut Wysokich Cisnien Polskiej Akademii Nauk rank among US patent assignees?

According to USPTO PatentsView (2015–2025 granted utility patents), Instytut Wysokich Cisnien Polskiej Akademii Nauk ranks #29,097 of 49,997 assignees by granted-patent volume, the same sort as the companies listing and top-holders ranking. See /methodology/#corpus-placement.

How many patents does Instytut Wysokich Cisnien Polskiej Akademii Nauk hold?

Instytut Wysokich Cisnien Polskiej Akademii Nauk holds 9 US utility patents granted between 2015 and 2023, spanning 16 technology areas.

What is Instytut Wysokich Cisnien Polskiej Akademii Nauk's Innovation Score?

Instytut Wysokich Cisnien Polskiej Akademii Nauk has an Innovation Score of 35.2 out of 100 (top 50% of the corpus). This composite metric weighs portfolio volume (40%), grant velocity (20%), technology breadth (25%), and claim depth (15%).

Is Instytut Wysokich Cisnien Polskiej Akademii Nauk's patent grant rate increasing or decreasing?

Instytut Wysokich Cisnien Polskiej Akademii Nauk's recent grant velocity is -50% compared to the prior five-year period (grant years, not application filing dates). Grant activity has slowed relative to earlier years.

What does claim depth mean for Instytut Wysokich Cisnien Polskiej Akademii Nauk's patents?

Instytut Wysokich Cisnien Polskiej Akademii Nauk's patents average 10.8 claims each. This is an aggregate descriptive count from the grant record; it does not establish claim scope, legal strength, enforceability, or design-around risk.

USPTO 2015–2025 USPTO PatentsView Foreign Corporation

Instytut Wysokich Cisnien Polskiej Akademii Nauk

Q: What technology areas does Instytut Wysokich Cisnien Polskiej Akademii Nauk focus on?

Instytut Wysokich Cisnien Polskiej Akademii Nauk's top technology area is H01S (Devices Using THE Process OF Light Amplification BY Stimulated Emission OF Radiation [LASER] TO Amplify OR Generate LIGHT; Devices Using Stimulated Emission OF Electromagnetic Radiation IN Wave Ranges Other Than Optical) with 4 patents. Grants appear in 16 CPC subclasses total.

Q: How is the Instytut Wysokich Cisnien Polskiej Akademii Nauk patent data sourced?

All patent data comes from USPTO PatentsView, a public research dataset maintained by the United States Patent and Trademark Office covering US granted utility patents from 2015 to 2025.

USPTO PatentsView assignee record - 9 granted patents across 16 technology areas, recorded in grant years 2015–2023. Grant-trend analysis is cross-referenced to USPTO Patent Public Search; it does not measure application filings, current R&D, or legal strength. Primary class: H01S (Devices Using THE Process OF Light Amplification BY Stimulated Emission OF Radiation [LASER] TO Amplify OR Generate LIGHT; Devices Using Stimulated Emission OF Electromagnetic Radiation IN Wave Ranges).

Compiled by PlainPatent · May 15, 2026

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The verdict

According to USPTO PatentsView, Instytut ranks #29,097 of 49,997 tracked US assignees by granted-patent volume, with 9 patents across 16 technology areas.

#29,097
of 49,997 US assignees by volume: Top 50%
by Innovation Score (35.2/100): 10.8
avg claims per patent: -50%
grant velocity, last 5 yrs

USPTO PatentsView assignee plate

Corpus R29097 · Foreign Corporation #29,097 · 9 grants

GRANTS-MICRO · MID-PACK · PHOTO-FINISH · CPC-FOCUS · INNOV-THIN · CLAIMS-PAR · TYPE-FRNCORP · VEL-DROP · BOOK-FULL

GRANTS-MICRO 9 grants
MID-PACK #29,097/49,997
PHOTO-FINISH Institute of…
CPC-FOCUS H01S · 16 areas
INNOV-THIN 35.2/100
CLAIMS-PAR 10.8 claims/avg
TYPE-FRNCORP Foreign Corp
VEL-DROP -50% vel
BOOK-FULL 10/10 fields

Nearest grant-volume peer: Institute of Experimental Botany AS CR, v.v.i. (UEB) (±0 grants)

Instrument codes from this assignee’s USPTO PatentsView grant sheet: volume band, corpus rank, photo-finish peer, lead CPC, Innovation Score, claim depth, assignee type, velocity, and book completeness. Not a USPTO rating of patent strength.

Qualcomm Incorporated · highest

85
Instytut Wysokich… · this assignee

35
3D Lighting… · lowest

7

What this shows Instytut's Innovation Score is 35.2/100 (top 50% of the PatentsView-derived corpus). The chart places that score against the nearest Innovation Score peers plus corpus poles, not a reprint of the volume ranking.

Where Instytut's grants concentrate

Instytut Wysokich Cisnien Polskiej Akademii Nauk is a focused PatentsView assignee: 16 CPC subclasses with 44.4% of grants classified under H01S (Devices Using THE Process OF Light Amplification BY Stimulated Emission OF Radiation [LASER] TO Amplify OR Generate LIGHT; Devices Using Stimulated Emission OF Electromagnetic Radiation IN Wave Ranges). Peak complete grant year is 2015 (2 grants) versus a trough of 1 in 2018. By volume, Instytut sits between Institute of Experimental Botany AS CR, v.v.i. (UEB) and Integrated Solutions International, LLC.

Instytut's three-year grant acceleration

Instytut Wysokich Cisnien Polskiej Akademii Nauk shows 2 grants in 2022–2024 against only 2 in 2019–2021. That prior window is too thin for a growth multiple (rename and spin-out assignees look artificially high when the baseline is near zero), so PlainPatent withholds a ranked acceleration claim here.

Institute of Expe…

9
Institute of Medi…

9
Instituto Potosin…

9
Inston

9
Insuline Medical

9
Integra Lifescien…

9
Integrated Sensin…

9
Integrated Soluti…

9
Instytut Wysokich… ◀

9

What this shows Instytut holds 9 patents at rank #29,101, shown against the 8 assignees closest to it in grant volume rather than the industry's largest filers.

Companies ranked near Instytut

By rank, the assignees closest to #29,101 in granted patent volume.

Leaders in H01S (Devices Using THE Process OF Light Amplification BY Stimu…)

Other assignees with the most granted patents in Instytut's primary technology class.

Instytut's Innovation Score vs. every tracked assignee

Composite of portfolio volume, grant velocity, technology breadth, and claim depth (0–100)

35 Top 50% higher than 50% of 49,997 US assignees

Each bar is a band; taller bars hold more US assignees. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.

Source USPTO PatentsView, PlainPatent Innovation Score · 2015–2025

USPTO utility patent grants by year · 2015–2023

Grants by year

Teal-shaded recent years (2020–present) versus the 2015–2019 baseline. Full figures in the table below.

View data table

Instytut Wysokich Cisnien Polskiej Akademii Nauk patent grants by year, 2015–2025
Year	Patents Granted	Share of Period
2015	2	22.2%
2017	2	22.2%
2018	1	11.1%
2019	1	11.1%
2021	1	11.1%
2022	1	11.1%
2023	1	11.1%

Which technologies does Instytut Wysokich Cisnien Polskiej Akademii Nauk patent most?

H01S - Devices Using THE Process OF Light Amplification BY Stimulated Emission OF Radiation [LASER] TO Amplify OR Generate LIGHT; Devices Using Stimulated Emission OF Electromagnetic Radiation IN Wave Ranges Other Than Optical 4

A61L - Methods OR Apparatus FOR Sterilising Materials OR Objects IN GENERAL; Disinfection, Sterilisation OR Deodorisation OF AIR; Chemical Aspects OF Bandages, Dressings, Absorbent Pads OR Surgical ARTICLES; Materials FOR Bandages, Dressings, Absorbent Pads OR Surgical Articles 3

H10H - Inorganic Light-emitting Semiconductor Devices Having Potential Barriers 2

C30B - Single-crystal Growth ; Unidirectional Solidification OF Eutectic Material OR Unidirectional Demixing OF Eutectoid MATERIAL; Refining BY Zone-melting OF Material ; Production OF A Homogeneous Polycrystalline Material With Defined Structure ; Single Crystals OR Homogeneous Polycrystalline Material WI 2

C22C - Alloys 2

B21C - Manufacture OF Metal Sheets, Wire, Rods, Tubes, Profiles OR Like Semi-manufactured Products Otherwise Than BY ROLLING; Auxiliary Operations Used IN Connection With Metal-working Without Essentially Removing Material 2

H10D - Inorganic Electric Semiconductor Devices 1

H01L - Semiconductor Devices NOT Covered BY Class H10 1

B82Y - Specific Uses OR Applications OF NANOSTRUCTURES; Measurement OR Analysis OF NANOSTRUCTURES; Manufacture OR Treatment OF Nanostructures 1

Y10T - Technical Subjects Covered BY Former US Classification 1

C21D - Modifying THE Physical Structure OF Ferrous METALS; General Devices FOR Heat Treatment OF Ferrous OR Non-ferrous Metals OR ALLOYS; Making Metal Malleable, e.g. BY Decarburisation OR Tempering 1

Y02P - Climate Change Mitigation Technologies IN THE Production OR Processing OF Goods 1

B21J - FORGING; HAMMERING; Pressing METAL; RIVETING; Forge Furnaces 1

G02B - Optical Elements, Systems OR Apparatus 1

C04B - Lime, MAGNESIA; SLAG; CEMENTS; Compositions Thereof, e.g. Mortars, Concrete OR Like Building MATERIALS; Artificial Stone ; Ceramics ; REFRACTORIES; Treatment OF Natural Stone 1

Top 15 of 16 technology areas

Where it ranks

Overall rank by patents

#29,097

of 49,997 tracked assignees

Innovation Score

35.2 out of 100

View all rankings →

Data Source

USPTO PatentsView, US granted patents 2015–2025

How is Innovation Score calculated?

What to do with this data

Instytut Wysokich Cisnien Polskiej Akademii Nauk's patent record in context - here's where to go next.

Instytut Wysokich Cisnien Polskiej Akademii Nauk's lead technology class is H01S (Devices Using THE Process OF Light Amplification BY Stimulated Emission OF Radiation [LASER] TO Amplify OR Generate LIGHT; Devices Using Stimulated Emission OF Electromagnetic Radiation IN Wave Ranges), 44.4% of its portfolio - see every assignee active in that class. Explore H01S
Ranked #29,097 of 49,997 tracked assignees by patent volume - see the full leaderboard. See the ranking
Compare Instytut Wysokich Cisnien Polskiej Akademii Nauk against Institute of Experimental Botany AS CR, v.v.i. (UEB), an assignee filing at a similar volume. Compare portfolios
Innovation Score of 35.2/100 blends volume, velocity, technology breadth, and claim depth. How it's calculated

Figures reflect USPTO PatentsView grant data through May 2026; pending applications not yet granted are not counted.

Data sourced from USPTO PatentsView - official U.S. government patent data. See our methodology for computation details. Retrieved and formatted by PlainPatent

Disclaimer: This information is provided for informational purposes only and does not constitute professional advice. Data is sourced from the USPTO PatentsView database. Consult a qualified professional before making decisions based on this data.

Read our methodology - how this data is sourced, computed, and verified.

Data sources used on this page

USPTO PatentsView - the disambiguated bulk patent-grant, assignee, and CPC data this page's figures are derived from. patentsview.org
Cooperative Patent Classification (CPC) - the joint USPTO/EPO classification scheme used to group patents by technology area. cooperativepatentclassification.org
USPTO Patent Public Search - the official interface to verify the status of any individual patent. ppubs.uspto.gov

Compiled by PlainPatent, US Patent Intelligence Editorial Process · May 15, 2026

Every figure on PlainPatent is rendered directly from USPTO source data, no number is typed in by an editor. This page draws directly on USPTO source data, no figure is typed in by an editor. See our editorial standards & corrections policy, the methodology behind these numbers, or report a data error. Data current as of May 2026.