Where does Sputtering Components, Inc. rank among US patent assignees?

According to USPTO PatentsView (2015–2025 granted utility patents), Sputtering Components, Inc. ranks #33,412 of 49,997 assignees by granted-patent volume, the same sort as the companies listing and top-holders ranking. See /methodology/#corpus-placement.

How many patents does Sputtering Components, Inc. hold?

Sputtering Components, Inc. holds 8 US utility patents granted between 2015 and 2020, spanning 4 technology areas.

What is Sputtering Components, Inc.'s Innovation Score?

Sputtering Components, Inc. has an Innovation Score of 27.2 out of 100 (23rd percentile of the corpus). This composite metric weighs portfolio volume (40%), grant velocity (20%), technology breadth (25%), and claim depth (15%).

What technology areas does Sputtering Components, Inc. focus on?

Sputtering Components, Inc.'s top technology area is H01J (Electric Discharge Tubes OR Discharge Lamps) with 6 patents, ranking #300 of 1,076 assignees active in that subclass. Grants appear in 4 CPC subclasses total.

Is Sputtering Components, Inc.'s patent grant rate increasing or decreasing?

Sputtering Components, Inc.'s recent grant velocity is -86% compared to the prior five-year period (grant years, not application filing dates). Grant activity has slowed relative to earlier years.

What does claim depth mean for Sputtering Components, Inc.'s patents?

Sputtering Components, Inc.'s patents average 20.9 claims each. This is an aggregate descriptive count from the grant record; it does not establish claim scope, legal strength, enforceability, or design-around risk.

How is the Sputtering Components, Inc. patent data sourced?

All patent data comes from USPTO PatentsView, a public research dataset maintained by the United States Patent and Trademark Office covering US granted utility patents from 2015 to 2025.

USPTO 2015–2025 USPTO PatentsView US Corporation

Sputtering Components, Inc.

USPTO PatentsView assignee record - 8 granted patents across 4 technology areas, recorded in grant years 2015–2020. Grant-trend analysis is cross-referenced to USPTO Patent Public Search; it does not measure application filings, current R&D, or legal strength. Primary class: H01J (Electric Discharge Tubes OR Discharge Lamps).

Compiled by PlainPatent · May 15, 2026

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Explore the portfolio See the ranking

The verdict

According to USPTO PatentsView, Sputtering ranks #33,412 of 49,997 tracked US assignees by granted-patent volume, with 8 patents across 4 technology areas.

#33,412
of 49,997 US assignees by volume: 23rd percentile
by Innovation Score (27.2/100): 20.9
avg claims per patent: -86%
grant velocity, last 5 yrs

USPTO PatentsView assignee plate

Corpus R33412 · US Corporation #33,412 · 8 grants

GRANTS-MICRO · MID-PACK · PHOTO-FINISH · CPC-NARROW · INNOV-THIN · CLAIMS-DENSE · TYPE-USCORP · VEL-DROP · BOOK-FULL

GRANTS-MICRO 8 grants
MID-PACK #33,412/49,997
PHOTO-FINISH Split Rock Filter…
CPC-NARROW H01J · 4 areas
INNOV-THIN 27.2/100
CLAIMS-DENSE 20.9 claims/avg
TYPE-USCORP US Corporation
VEL-DROP -86% vel
BOOK-FULL 10/10 fields

Nearest grant-volume peer: Split Rock Filter Systems LLC (±0 grants)

Instrument codes from this assignee’s USPTO PatentsView grant sheet: volume band, corpus rank, photo-finish peer, lead CPC, Innovation Score, claim depth, assignee type, velocity, and book completeness. Not a USPTO rating of patent strength.

How Sputtering’s 27.2 Innovation Score adds up

The same four weighted components behind every Innovation Score on PlainPatent: portfolio volume, grant velocity, technology breadth, and claim depth.

Volume 7.6 pts (28%) Velocity 0.0 pts (0%) Breadth 7.1 pts (26%) Claim depth 12.5 pts (46%)

Qualcomm Incorporated · highest

85
Sputtering Components · this assignee

27
3D Lighting… · lowest

7

What this shows Sputtering's Innovation Score is 27.2/100 (23rd percentile of the PatentsView-derived corpus). The chart places that score against the nearest Innovation Score peers plus corpus poles, not a reprint of the volume ranking.

Does more volume mean deeper claims for Sputtering?

Each dot is one of Sputtering’s 8 nearest volume peers (same corpus rank neighbourhood as the chart above), placed by total granted patents (horizontal) against average claims per patent (vertical). Sputtering’s own 20.9 claims/patent is ABOVE the 17.3 median for these volume peers. More thorough claims than most filers at this scale, not just more of them.

Sputtering vs its 8 nearest volume peers: granted patents vs average claims per patent. Source: USPTO PatentsView.

Where Sputtering's grants concentrate

Sputtering Components, Inc. is a focused PatentsView assignee: 4 CPC subclasses with 75% of grants classified under H01J (Electric Discharge Tubes OR Discharge Lamps). Peak complete grant year is 2016 (4 grants) versus a trough of 1 in 2015. By volume, Sputtering sits between Split Rock Filter Systems LLC and StaCyc, LLC.

Split Rock Filter…

8
Spokane Industries

8
Spring (U )

8
Springseal

8
Sqream

8
Square Panda

8
Square Robot

8
Stacyc

8
Sputtering Compon… ◀

8

What this shows Sputtering holds 8 patents at rank #33,445, shown against the 8 assignees closest to it in grant volume rather than the industry's largest filers.

Companies ranked near Sputtering

By rank, the assignees closest to #33,445 in granted patent volume.

Leaders in H01J (Electric Discharge Tubes OR Discharge Lamps)

Other assignees with the most granted patents in Sputtering's primary technology class.

Sputtering's Innovation Score vs. every tracked assignee

Composite of portfolio volume, grant velocity, technology breadth, and claim depth (0–100)

27 23rd percentile higher than 23% of 49,997 US assignees

Each bar is a band; taller bars hold more US assignees. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.

Source USPTO PatentsView, PlainPatent Innovation Score · 2015–2025

USPTO utility patent grants by year · 2015–2020

Grants by year

Teal-shaded recent years (2020–present) versus the 2015–2019 baseline. Full figures in the table below.

View data table

Sputtering Components, Inc. patent grants by year, 2015–2025
Year	Patents Granted	Share of Period
2015	1	12.5%
2016	4	50.0%
2017	2	25.0%
2020	1	12.5%

Which technologies does Sputtering Components, Inc. patent most?

H01J - Electric Discharge Tubes OR Discharge Lamps 6

C23C - Coating Metallic MATERIAL; Coating Material With Metallic MATERIAL; Surface Treatment OF Metallic Material BY Diffusion Into THE Surface, BY Chemical Conversion OR SUBSTITUTION; Coating BY Vacuum Evaporation, BY Sputtering, BY ION Implantation OR BY Chemical Vapour Deposition, IN General 3

H05H - Plasma Technique ; Production OF Accelerated Electrically-charged Particles OR OF NEUTRONS; Production OR Acceleration OF Neutral Molecular OR Atomic Beams 1

H01F - MAGNETS; INDUCTANCES; TRANSFORMERS; Selection OF Materials FOR Their Magnetic Properties 1

Top 4 of 4 technology areas

More on this record

Data Source

USPTO PatentsView, US granted patents 2015–2025

View all rankings → How is Innovation Score calculated?

What to do with this data

Sputtering Components, Inc.'s patent record in context - here's where to go next.

Sputtering Components, Inc.'s lead technology class is H01J (Electric Discharge Tubes OR Discharge Lamps), 75% of its portfolio - see every assignee active in that class. Explore H01J
Ranked #33,412 of 49,997 tracked assignees by patent volume - see the full leaderboard. See the ranking
Compare Sputtering Components, Inc. against Split Rock Filter Systems LLC, an assignee filing at a similar volume. Compare portfolios
Innovation Score of 27.2/100 blends volume, velocity, technology breadth, and claim depth. How it's calculated

Figures reflect USPTO PatentsView grant data through May 2026; pending applications not yet granted are not counted.

Data sourced from USPTO PatentsView - official U.S. government patent data. See our methodology for computation details. Retrieved and formatted by PlainPatent

Disclaimer: This information is provided for informational purposes only and does not constitute professional advice. Data is sourced from the USPTO PatentsView database. Consult a qualified professional before making decisions based on this data.

Read our methodology - how this data is sourced, computed, and verified.

Data sources used on this page

USPTO PatentsView - the disambiguated bulk patent-grant, assignee, and CPC data this page's figures are derived from. patentsview.org
Cooperative Patent Classification (CPC) - the joint USPTO/EPO classification scheme used to group patents by technology area. cooperativepatentclassification.org
USPTO Patent Public Search - the official interface to verify the status of any individual patent. ppubs.uspto.gov

Compiled by PlainPatent , US Patent Intelligence Editorial Process · May 15, 2026

Every figure on PlainPatent is rendered directly from USPTO source data, no number is typed in by an editor. This page draws directly on USPTO source data, no figure is typed in by an editor. See our editorial standards & corrections policy, the methodology behind these numbers, or report a data error. Data current as of May 2026.