PlainPatent
USPTO 2015–2025 USPTO PatentsView Foreign Corporation

Kjellberg Finsterwalde Plasma Und Maschinen GmbH

USPTO PatentsView assignee record - 6 granted patents across 2 technology areas, recorded in grant years 2015–2017. Grant-trend analysis is cross-referenced to USPTO Patent Public Search; it does not measure application filings, current R&D, or legal strength. Primary class: H05H (Plasma Technique ; Production OF Accelerated Electrically-charged Particles OR OF NEUTRONS; Production OR Acceleration OF Neutral Molecular OR Atomic Beams).

RSS updates for this company
Explore the portfolio See the ranking

The verdict

According to USPTO PatentsView, Kjellberg ranks #41,246 of 49,997 tracked US assignees by granted-patent volume, with 6 patents across 2 technology areas.

#41,246
of 49,997 US assignees by volume
21st percentile
by Innovation Score (26.7/100)
31.7
avg claims per patent
-100%
grant velocity, last 5 yrs

USPTO PatentsView assignee plate

Corpus R41246 · Foreign Corporation #41,246 · 6 grants

GRANTS-MICRO · LOWER-Q · PHOTO-FINISH · CPC-NARROW · INNOV-THIN · CLAIMS-DENSE · TYPE-FRNCORP · VEL-DROP · BOOK-FULL

  • GRANTS-MICRO 6 grants
  • LOWER-Q #41,246/49,997
  • PHOTO-FINISH Kineticure
  • CPC-NARROW H05H · 2 areas
  • INNOV-THIN 26.7/100
  • CLAIMS-DENSE 31.7 claims/avg
  • TYPE-FRNCORP Foreign Corp
  • VEL-DROP -100% vel
  • BOOK-FULL 10/10 fields

Nearest grant-volume peer: Kineticure, LLC (±0 grants)

Instrument codes from this assignee’s USPTO PatentsView grant sheet: volume band, corpus rank, photo-finish peer, lead CPC, Innovation Score, claim depth, assignee type, velocity, and book completeness. Not a USPTO rating of patent strength.

How Kjellberg’s 26.7 Innovation Score adds up

The same four weighted components behind every Innovation Score on PlainPatent: portfolio volume, grant velocity, technology breadth, and claim depth.

Innovation-score neighbourhood around Kjellberg

Lowest and highest poles plus nearest Innovation Score peers, not a full corpus board reprint.

score

What this shows Kjellberg's Innovation Score is 26.7/100 (21st percentile of the PatentsView-derived corpus). The chart places that score against the nearest Innovation Score peers plus corpus poles, not a reprint of the volume ranking.

Source USPTO PatentsView, PlainPatent Innovation Score As of 2015–2025

Does more volume mean deeper claims for Kjellberg?

Each dot is one of Kjellberg’s 8 nearest volume peers (same corpus rank neighbourhood as the chart above), placed by total granted patents (horizontal) against average claims per patent (vertical). Kjellberg’s own 31.7 claims/patent is ABOVE the 15.2 median for these volume peers. More thorough claims than most filers at this scale, not just more of them.

Kjellberg vs its 8 nearest volume peers: granted patents vs average claims per patent. Source: USPTO PatentsView. 2×2 strategic matrix plotting 9 entities by Granted patents (volume) (X) and Avg claims / patent (Y), with a crosshair dividing the plot into four quadrants. Volume + depthSelective & thoroughVolume over depthLean filer 5.96.06.066.06.06.1 010203040 Granted patents (volume) Avg claims / patent Kineticure, LLC - 6, 17.5KineticureKing Nutronics, LLC - 6, 19.17King NutronicsKingspan Insulated Panels, Inc. - 6, 11.83Kingspan Insulate…KitoTech Medical, Inc. - 6, 20.5Kitotech MedicalKlas Technologies Limited - 6, 15.33KlasKlear Solutions - 6, 5.17Klear SolutionsKlein Medical Limited - 6, 13.33Klein MedicalKlevaklip Systems Pty Ltd - 6, 15.17Klevaklip Systems…Kjellberg Finsterwalde Plasma Und Maschinen GmbH - 6, 31.67Kjellberg Finster…
Kjellberg vs its 8 nearest volume peers: granted patents vs average claims per patent. Source: USPTO PatentsView.

Where Kjellberg's grants concentrate

Kjellberg Finsterwalde Plasma Und Maschinen GmbH is a focused PatentsView assignee: 2 CPC subclasses with 83.3% of grants classified under H05H (Plasma Technique ; Production OF Accelerated Electrically-charged Particles OR OF NEUTRONS; Production OR Acceleration OF Neutral Molecular OR Atomic Beams). Peak complete grant year is 2015 (4 grants) versus a trough of 2 in 2017. By volume, Kjellberg sits between Kineticure, LLC and Klevaklip Systems Pty Ltd.

Who files at Kjellberg's volume?

Granted US patents 2015–2025 versus its nearest-ranked assignees by volume, this company marked ◀

patents

What this shows Kjellberg holds 6 patents at rank #41,259, shown against the 8 assignees closest to it in grant volume rather than the industry's largest filers.

Source USPTO PatentsView, granted utility patents As of 2015–2025

Companies ranked near Kjellberg

By rank, the assignees closest to #41,259 in granted patent volume.

Leaders in H05H (Plasma Technique)

Other assignees with the most granted patents in Kjellberg's primary technology class.

Kjellberg's Innovation Score vs. every tracked assignee

Composite of portfolio volume, grant velocity, technology breadth, and claim depth (0–100)

27 21st percentile higher than 21% of 49,997 US assignees

This assignee 0 100 every tracked assignee, bucketed by value

Each bar is a band; taller bars hold more US assignees. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.

Source USPTO PatentsView, PlainPatent Innovation Score · 2015–2025

1.522.533.544.5 20152017 2
USPTO utility patent grants by year · 2015–2017

Grants by year

Teal-shaded recent years (2020–present) versus the 2015–2019 baseline. Full figures in the table below.

View data table
Kjellberg Finsterwalde Plasma Und Maschinen GmbH patent grants by year, 2015–2025
Year Patents Granted Share of Period
2015 4 66.7%
2017 2 33.3%

Which technologies does Kjellberg Finsterwalde Plasma Und Maschinen GmbH patent most?

Top 2 of 2 technology areas

More on this record

Data Source

USPTO PatentsView, US granted patents 2015–2025

View all rankings → How is Innovation Score calculated?

What to do with this data

Kjellberg Finsterwalde Plasma Und Maschinen GmbH's patent record in context - here's where to go next.

  • Kjellberg Finsterwalde Plasma Und Maschinen GmbH's lead technology class is H05H (Plasma Technique ; Production OF Accelerated Electrically-charged Particles OR OF NEUTRONS; Production OR Acceleration OF Neutral Molecular OR Atomic Beams), 83.3% of its portfolio - see every assignee active in that class. Explore H05H
  • Ranked #41,246 of 49,997 tracked assignees by patent volume - see the full leaderboard. See the ranking
  • Compare Kjellberg Finsterwalde Plasma Und Maschinen GmbH against Kineticure, LLC, an assignee filing at a similar volume. Compare portfolios
  • Innovation Score of 26.7/100 blends volume, velocity, technology breadth, and claim depth. How it's calculated

Figures reflect USPTO PatentsView grant data through May 2026; pending applications not yet granted are not counted.

Data sourced from USPTO PatentsView - official U.S. government patent data. See our methodology for computation details. Retrieved and formatted by PlainPatent

Disclaimer: This information is provided for informational purposes only and does not constitute professional advice. Data is sourced from the USPTO PatentsView database. Consult a qualified professional before making decisions based on this data.

Read our methodology - how this data is sourced, computed, and verified.

Data sources used on this page
  • USPTO PatentsView - the disambiguated bulk patent-grant, assignee, and CPC data this page's figures are derived from. patentsview.org
  • Cooperative Patent Classification (CPC) - the joint USPTO/EPO classification scheme used to group patents by technology area. cooperativepatentclassification.org
  • USPTO Patent Public Search - the official interface to verify the status of any individual patent. ppubs.uspto.gov

Every figure on PlainPatent is rendered directly from USPTO source data, no number is typed in by an editor. This page draws directly on USPTO source data, no figure is typed in by an editor. See our editorial standards & corrections policy, the methodology behind these numbers, or report a data error. Data current as of May 2026.