Where does Ecole Centrale DE Nantes rank among US patent assignees?

According to USPTO PatentsView (2015–2025 granted utility patents), Ecole Centrale DE Nantes ranks #28,633 of 49,997 assignees by granted-patent volume, the same sort as the companies listing and top-holders ranking. See /methodology/#corpus-placement.

How many patents does Ecole Centrale DE Nantes hold?

Ecole Centrale DE Nantes holds 9 US utility patents granted between 2017 and 2025, spanning 20 technology areas.

What is Ecole Centrale DE Nantes's Innovation Score?

Ecole Centrale DE Nantes has an Innovation Score of 31.6 out of 100 (38th percentile of the corpus). This composite metric weighs portfolio volume (40%), grant velocity (20%), technology breadth (25%), and claim depth (15%).

Is Ecole Centrale DE Nantes's patent grant rate increasing or decreasing?

Ecole Centrale DE Nantes's recent grant velocity is +0% compared to the prior five-year period (grant years, not application filing dates). The company is maintaining or growing its granted-patent output.

What does claim depth mean for Ecole Centrale DE Nantes's patents?

Ecole Centrale DE Nantes's patents average 10.9 claims each. This is an aggregate descriptive count from the grant record; it does not establish claim scope, legal strength, enforceability, or design-around risk.

How is the Ecole Centrale DE Nantes patent data sourced?

All patent data comes from USPTO PatentsView, a public research dataset maintained by the United States Patent and Trademark Office covering US granted utility patents from 2015 to 2025.

USPTO 2015–2025 USPTO PatentsView Foreign Corporation

Ecole Centrale DE Nantes

Q: What technology areas does Ecole Centrale DE Nantes focus on?

Ecole Centrale DE Nantes's top technology area is B33Y (Additive Manufacturing, i.e. Manufacturing OF Three-dimensional [3-D] Objects BY Additive Deposition, Additive Agglomeration OR Additive Layering, e.g. BY 3-D Printing, Stereolithography OR Selective Laser Sintering) with 5 patents, ranking #333 of 1,250 assignees active in that subclass. Grants appear in 20 CPC subclasses total.

USPTO PatentsView assignee record - 9 granted patents across 20 technology areas, recorded in grant years 2017–2025. Grant-trend analysis is cross-referenced to USPTO Patent Public Search; it does not measure application filings, current R&D, or legal strength. Primary class: B33Y (Additive Manufacturing, i.e. Manufacturing OF Three-dimensional [3-D] Objects BY Additive Deposition, Additive Agglomeration OR Additive Layering, e.g. BY 3-D Printing, Stereolithography OR Selective ).

Compiled by PlainPatent · May 15, 2026

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The verdict

According to USPTO PatentsView, Ecole ranks #28,633 of 49,997 tracked US assignees by granted-patent volume, with 9 patents across 20 technology areas.

#28,633
of 49,997 US assignees by volume: 38th percentile
by Innovation Score (31.6/100): 10.9
avg claims per patent: +0%
grant velocity, last 5 yrs

USPTO PatentsView assignee plate

Corpus R28633 · Foreign Corporation #28,633 · 9 grants

GRANTS-MICRO · MID-PACK · PHOTO-FINISH · CPC-FOCUS · INNOV-THIN · CLAIMS-PAR · TYPE-FRNCORP · VEL-FLAT · BOOK-FULL

GRANTS-MICRO 9 grants
MID-PACK #28,633/49,997
PHOTO-FINISH Ebara International
CPC-FOCUS B33Y · 20 areas
INNOV-THIN 31.6/100
CLAIMS-PAR 10.9 claims/avg
TYPE-FRNCORP Foreign Corp
VEL-FLAT +0% vel
BOOK-FULL 10/10 fields

Nearest grant-volume peer: Ebara International Corporation (±0 grants)

Instrument codes from this assignee’s USPTO PatentsView grant sheet: volume band, corpus rank, photo-finish peer, lead CPC, Innovation Score, claim depth, assignee type, velocity, and book completeness. Not a USPTO rating of patent strength.

How Ecole’s 31.6 Innovation Score adds up

The same four weighted components behind every Innovation Score on PlainPatent: portfolio volume, grant velocity, technology breadth, and claim depth.

Volume 8.0 pts (25%) Velocity 1.3 pts (4%) Breadth 15.8 pts (50%) Claim depth 6.5 pts (21%)

Qualcomm Incorporated · highest

85
Ecole Centrale DE… · this assignee

32
3D Lighting… · lowest

7

What this shows Ecole's Innovation Score is 31.6/100 (38th percentile of the PatentsView-derived corpus). The chart places that score against the nearest Innovation Score peers plus corpus poles, not a reprint of the volume ranking.

Does more volume mean deeper claims for Ecole?

Each dot is one of Ecole’s 8 nearest volume peers (same corpus rank neighbourhood as the chart above), placed by total granted patents (horizontal) against average claims per patent (vertical). Ecole’s own 10.9 claims/patent is at or below the 12.7 median for these volume peers. Volume here does not track with deeper claims; several lower-volume peers claim more thoroughly per patent.

Ecole vs its 8 nearest volume peers: granted patents vs average claims per patent. Source: USPTO PatentsView.

Where Ecole's grants concentrate

Ecole Centrale DE Nantes is a focused PatentsView assignee: 20 CPC subclasses with 55.6% of grants classified under B33Y (Additive Manufacturing, i.e. Manufacturing OF Three-dimensional [3-D] Objects BY Additive Deposition, Additive Agglomeration OR Additive Layering, e.g. BY 3-D Printing, Stereolithography OR Selective ). Peak complete grant year is 2020 (3 grants) versus a trough of 1 in 2017. By volume, Ecole sits between Ebara International Corporation and Edward Vinson Ltd..

Ecole's three-year grant acceleration

Ecole Centrale DE Nantes shows 1 grants in 2022–2024 against only 5 in 2019–2021. That prior window is too thin for a growth multiple (rename and spin-out assignees look artificially high when the baseline is near zero), so PlainPatent withholds a ranked acceleration claim here.

Ebara Internation…

9
ECC TEC MSJ Incor…

9
Echowell

9
ECI Pharmaceutica…

9
Ecole Nationale S…

9
Economic Alchemy

9
Edgewise Therapeu…

9
Edward Vinson

9
Ecole Centrale DE… ◀

9

What this shows Ecole holds 9 patents at rank #28,622, shown against the 8 assignees closest to it in grant volume rather than the industry's largest filers.

Companies ranked near Ecole

By rank, the assignees closest to #28,622 in granted patent volume.

Leaders in B33Y (Additive Manufacturing)

Other assignees with the most granted patents in Ecole's primary technology class.

Ecole's Innovation Score vs. every tracked assignee

Composite of portfolio volume, grant velocity, technology breadth, and claim depth (0–100)

32 38th percentile higher than 38% of 49,997 US assignees

Each bar is a band; taller bars hold more US assignees. The dashed line + filled bar mark this entry. Hover or tap any bar for its full count, share, and where it sits relative to this entry.

Source USPTO PatentsView, PlainPatent Innovation Score · 2015–2025

USPTO utility patent grants by year · 2017–2025

Grants by year

Teal-shaded recent years (2020–present) versus the 2017–2019 baseline. Full figures in the table below.

View data table

Ecole Centrale DE Nantes patent grants by year, 2015–2025
Year	Patents Granted	Share of Period
2017	1	11.1%
2018	1	11.1%
2019	2	22.2%
2020	3	33.3%
2024	1	11.1%
2025partial year	1	11.1%

Which technologies does Ecole Centrale DE Nantes patent most?

B33Y - Additive Manufacturing, i.e. Manufacturing OF Three-dimensional [3-D] Objects BY Additive Deposition, Additive Agglomeration OR Additive Layering, e.g. BY 3-D Printing, Stereolithography OR Selective Laser Sintering 5

Y02P - Climate Change Mitigation Technologies IN THE Production OR Processing OF Goods 4

B22F - Working Metallic POWDER; Manufacture OF Articles From Metallic POWDER; Making Metallic Powder ; Apparatus OR Devices Specially Adapted FOR Metallic Powder 3

G05B - Control OR Regulating Systems IN GENERAL; Functional Elements OF Such SYSTEMS; Monitoring OR Testing Arrangements FOR Such Systems OR Elements 3

B29C - Shaping OR Joining OF PLASTICS; Shaping OF Material IN A Plastic State, NOT Otherwise Provided FOR; After-treatment OF THE Shaped Products, e.g. Repairing 3

B05B - Spraying APPARATUS; Atomising APPARATUS; Nozzles 2

B23K - Soldering OR UNSOLDERING; WELDING; Cladding OR Plating BY Soldering OR WELDING; Cutting BY Applying Heat Locally, e.g. Flame CUTTING; Working BY Laser Beam 2

B21D - Working OR Processing OF Sheet Metal OR Metal Tubes, Rods OR Profiles Without Essentially Removing MATERIAL; Punching Metal 2

B22C - Foundry Moulding 1

B28B - Shaping Clay OR Other Ceramic COMPOSITIONS; Shaping SLAG; Shaping Mixtures Containing Cementitious Material, e.g. Plaster 1

G06F - Electric Digital Data Processing 1

F16M - Frames, Casings OR Beds OF Engines, Machines OR Apparatus, NOT Specific TO Engines, Machines OR Apparatus Provided FOR ELSEWHERE; STANDS; Supports 1

B25J - MANIPULATORS; Chambers Provided With Manipulation Devices 1

G06T - Image Data Processing OR Generation, IN General 1

B29L - Indexing Scheme Associated With Subclass B29c, Relating TO Particular Articles 1

Top 15 of 20 technology areas

More on this record

Data Source

USPTO PatentsView, US granted patents 2015–2025

View all rankings → How is Innovation Score calculated?

What to do with this data

Ecole Centrale DE Nantes's patent record in context - here's where to go next.

Ecole Centrale DE Nantes's lead technology class is B33Y (Additive Manufacturing, i.e. Manufacturing OF Three-dimensional [3-D] Objects BY Additive Deposition, Additive Agglomeration OR Additive Layering, e.g. BY 3-D Printing, Stereolithography OR Selective ), 55.6% of its portfolio - see every assignee active in that class. Explore B33Y
Ranked #28,633 of 49,997 tracked assignees by patent volume - see the full leaderboard. See the ranking
Compare Ecole Centrale DE Nantes against Ebara International Corporation, an assignee filing at a similar volume. Compare portfolios
Innovation Score of 31.6/100 blends volume, velocity, technology breadth, and claim depth. How it's calculated

Figures reflect USPTO PatentsView grant data through May 2026; pending applications not yet granted are not counted.

Data sourced from USPTO PatentsView - official U.S. government patent data. See our methodology for computation details. Retrieved and formatted by PlainPatent

Disclaimer: This information is provided for informational purposes only and does not constitute professional advice. Data is sourced from the USPTO PatentsView database. Consult a qualified professional before making decisions based on this data.

Read our methodology - how this data is sourced, computed, and verified.

Data sources used on this page

USPTO PatentsView - the disambiguated bulk patent-grant, assignee, and CPC data this page's figures are derived from. patentsview.org
Cooperative Patent Classification (CPC) - the joint USPTO/EPO classification scheme used to group patents by technology area. cooperativepatentclassification.org
USPTO Patent Public Search - the official interface to verify the status of any individual patent. ppubs.uspto.gov

Compiled by PlainPatent , US Patent Intelligence Editorial Process · May 15, 2026

Every figure on PlainPatent is rendered directly from USPTO source data, no number is typed in by an editor. This page draws directly on USPTO source data, no figure is typed in by an editor. See our editorial standards & corrections policy, the methodology behind these numbers, or report a data error. Data current as of May 2026.